Selective deposition of amorphous hydrogenated carbon films used as masks for reactive ion etching of Si using CF4

Vacuum ◽  
1999 ◽  
Vol 52 (3) ◽  
pp. 313-314 ◽  
Author(s):  
Marco AR Alves ◽  
Olga Balachova ◽  
Edmundo da Silva Braga ◽  
Lucila Cescato
Keyword(s):  
Reactive Ion Etching ◽  
Carbon Films ◽  
Selective Deposition ◽  
Ion Etching ◽  
Amorphous Hydrogenated Carbon

Amorphous hydrogenated carbon films used as masks for silicon microtips fabrication in a reactive ion etching with SF6 plasma

Vacuum ◽  
2004 ◽  
Vol 72 (4) ◽  
pp. 485-488 ◽  
Author(s):  
Marco A.R. Alves ◽  
Lésnir F. Porto ◽  
Pedro H.L. de Faria ◽  
Edmundo S. Braga
Keyword(s):  
Reactive Ion Etching ◽  
Carbon Films ◽  
Ion Etching ◽  
Amorphous Hydrogenated Carbon

scholarly journals Plasma nanotexturing of amorphous carbon films by reactive ion etching

2018 ◽  
Vol 354 ◽  
pp. 153-160 ◽  
Author(s):  
Armstrong Godoy ◽  
Felipe Gondim Carlucci ◽  
Douglas Marcel Gonçalves Leite ◽  
Walter Miyakawa ◽  
André Luis Jesus Pereira ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Reactive Ion Etching ◽  
Carbon Films ◽  
Ion Etching ◽  
Amorphous Carbon Films

Reactive ion etching of ion-plated carbon films

Vacuum ◽  
1997 ◽  
Vol 48 (7-9) ◽  
pp. 681-684 ◽  
Author(s):  
K Popova
Keyword(s):  
Reactive Ion Etching ◽  
Carbon Films ◽  
Ion Etching

Reactive ion etching of diamond and diamond-like carbon films

1994 ◽  
Vol 3 (4-6) ◽  
pp. 645-649 ◽  
Author(s):  
C. Vivensang ◽  
G. Turban ◽  
E. Anger ◽  
A. Gicquel
Keyword(s):  
Reactive Ion Etching ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Ion Etching

Magnetron Reactive Ion Etching of GaAs and AIGaAs in CH4/H2/Ar Plasmas.

1996 ◽  
Author(s):  
George F. McLane ◽  
Paul Cooke ◽  
Robert P. Moerkirk
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching

Modification of the n-Surface Profile of AlGaInN LEDs by Changing the Gas-Mixture Composition During Reactive Ion Etching

2020 ◽  
Vol 54 (6) ◽  
pp. 672-676
Author(s):  
L. K. Markov ◽  
I. P. Smirnova ◽  
M. V. Kukushkin ◽  
A. S. Pavluchenko
Keyword(s):  
Reactive Ion Etching ◽  
Surface Profile ◽  
Mixture Composition ◽  
Gas Mixture ◽  
Ion Etching

Reactive ion etching of III-V compounds using C2H6/H2

1988 ◽  
Vol 24 (13) ◽  
pp. 798 ◽  
Author(s):  
T. Matsui ◽  
H. Sugimoto ◽  
T. Ohishi ◽  
H. Ogata
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching

GaInAsP/InP mass transport laser monolithically integrated with photodetector using reactive ion etching

1989 ◽  
Vol 25 (15) ◽  
pp. 954 ◽  
Author(s):  
T. Matsui ◽  
H. Sugimoto ◽  
K. Ohtsuka ◽  
Y. Abe ◽  
H. Ogata
Keyword(s):  
Mass Transport ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Monolithically Integrated
Sign in / Sign up

Export Citation Format

Share Document