Chemical deposition method for metal chalcogenide thin films

2000 ◽  
Vol 65 (1) ◽  
pp. 1-31 ◽  
Author(s):  
R.S. Mane ◽  
C.D. Lokhande
Author(s):  
Sucheta Sengupta ◽  
Rinki Aggarwal ◽  
Yuval Golan

This review article gives an overview of different complexing agents used during chemical deposition of metal chalcogenide thin films and their role in controlling the resultant morphology by effective complexation of the metal ion.


2003 ◽  
Vol 53 (1) ◽  
pp. 287-297
Author(s):  
Susumu Kawasaki ◽  
Shin-Ichi Motoyama ◽  
Toshiaki Tatsuta ◽  
Osamu Tsuji ◽  
Tadashi Shiosaki

1997 ◽  
Vol 9 (1/2) ◽  
pp. 132-133
Author(s):  
Kazuhiro KATOH ◽  
Naoto WASHIO ◽  
Akinori KATSUI

2003 ◽  
Vol 53 (1) ◽  
pp. 287-297
Author(s):  
Susumu Kawasaki ◽  
Shin-Ichi Motoyama ◽  
Toshiaki Tatsuta ◽  
Osamu Tsuji ◽  
Tadashi Shiosaki

2019 ◽  
Vol 48 (11) ◽  
pp. 7539-7542
Author(s):  
V. S. Jamadade ◽  
P. K. Pagare ◽  
Dhanshri S. Gaikwad ◽  
A. S. Burungale ◽  
V. S. Sawant

1992 ◽  
Vol 11 (16) ◽  
pp. 1097-1099 ◽  
Author(s):  
G. N. Chaudhari ◽  
S. D. Sathaye ◽  
Prabhat Singh ◽  
V. J. Rao ◽  
V. Manorama ◽  
...  

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