Growth of hydrogenated microcrystalline silicon thin films using electron cyclotron resonance chemical deposition method

Chemical Deposition ◽

Electron Cyclotron ◽

Deposition Method ◽

Silicon Thin Films ◽

Chemical Deposition Method

Microcrystalline silicon thin films deposited by matrix-distributed electron cyclotron resonance plasma enhanced chemical vapor deposition using an SiF4 /H2chemistry

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/49/28/285203 ◽

2016 ◽

Vol 49 (28) ◽

pp. 285203 ◽

Cited By ~ 4

Author(s):

Junkang Wang ◽

Pavel Bulkin ◽

Ileana Florea ◽

Jean-Luc Maurice ◽

Erik Johnson

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Silicon Thin Films ◽

Plasma emission diagnostics during fast deposition of microcrystalline silicon thin films in matrix distributed electron cyclotron resonance plasma CVD system

physica status solidi (c) ◽

10.1002/pssc.200982817 ◽

2010 ◽

pp. NA-NA

Author(s):

Sanjay K. Ram ◽

Laurent Kroely ◽

Samir Kasouit ◽

Pavel Bulkin ◽

Pere Roca i Cabarrocas

Keyword(s):

Thin Films ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Emission ◽

Plasma Cvd ◽

Electron Cyclotron Resonance Plasma ◽

Silicon Thin Films ◽

Effects of initial layers on surface roughness and crystallinity of microcrystalline silicon thin films formed by remote electron cyclotron resonance silane plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1458945 ◽

2002 ◽

Vol 20 (3) ◽

pp. 953-956 ◽

Cited By ~ 1

Author(s):

Kazuya Murata ◽

Daisuke Kikukawa ◽

Masaru Hori ◽

Toshio Goto ◽

Masafumi Ito

Keyword(s):

Thin Films ◽

Surface Roughness ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Silicon Thin Films ◽

Initial Layers ◽

Silane Plasma

Nanocrystalline Silicon Thin Films Fabricated at 80°C by Using Electron Cyclotron Resonance Chemical Vapor Deposition

Plasma Science and Technology ◽

10.1088/1009-0630/12/5/19 ◽

2010 ◽

Vol 12 (5) ◽

pp. 608-613 ◽

Cited By ~ 2

Author(s):

I. Y. Y Bu ◽

A. J Flewitt ◽

W. I Miline

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Electron Cyclotron ◽

Silicon Thin Films

Study on Deposition Method of ITO Thin Films with Large Area by Electron Cyclotron Resonance Plasma Sputtering.

Shinku ◽

10.3131/jvsj.44.272 ◽

2001 ◽

Vol 44 (3) ◽

pp. 272-275

Author(s):

Toshiaki YASUI ◽

Hirokazu TAHARA ◽

Takao YOSHIKAWA

Keyword(s):

Thin Films ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Deposition Method ◽

Large Area ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Ito Thin Films ◽

Effect of thermal coupling on the electronic properties of hydrogenated amorphous silicon thin films deposited by electron cyclotron resonance

Thin Solid Films ◽

10.1016/j.tsf.2006.11.105 ◽

2007 ◽

Vol 515 (19) ◽

pp. 7650-7653 ◽

Cited By ~ 4

Author(s):

T.H. Dao ◽

M.E. Gueunier-Farret ◽

D. Daineka ◽

P. Bulkin ◽

P. Roca i Cabarrocas ◽

...

Keyword(s):

Thin Films ◽

Amorphous Silicon ◽

Electronic Properties ◽

Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Electron Cyclotron ◽

Thermal Coupling ◽

Silicon Thin Films ◽

Hydrogenated Amorphous

Structural Properties of Silicon Thin Films Prepared by Hot-Wire-Assisted Electron Cyclotron Resonance Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.46.751 ◽

2007 ◽

Vol 46 (2) ◽

pp. 751-755

Author(s):

Ying Li ◽

Minoru Kumeda ◽

Akiharu Morimoto ◽

Takeshi Kawae ◽

Guanghua Chen

Keyword(s):

Thin Films ◽

Structural Properties ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Hot Wire ◽

Silicon Thin Films

Evolution of structure in thin microcrystalline silicon films grown by electron-cyclotron resonance chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1289783 ◽

2000 ◽

Vol 88 (7) ◽

pp. 4376 ◽

Cited By ~ 40

Author(s):

M. Birkholz ◽

B. Selle ◽

E. Conrad ◽

K. Lips ◽

W. Fuhs

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Silicon Films ◽

Evolution Of Structure

Dielectric Permittivity of Amorphous and Hexagonal Electron Cyclotron Resonance Plasma Deposited Ta[sub 2]O[sub 5] Thin Films

Electrochemical and Solid-State Letters ◽

10.1149/1.1390814 ◽

1999 ◽

Vol 2 (6) ◽

pp. 291 ◽

Cited By ~ 11

Author(s):

C. Chaneliere

Keyword(s):

Thin Films ◽

Dielectric Permittivity ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Microcrystalline silicon films and solar cells deposited at high rate by Matrix Distributed Electron Cyclotron Resonance (MDECR) plasma

physica status solidi (c) ◽

10.1002/pssc.200982789 ◽

2010 ◽

pp. NA-NA ◽

Cited By ~ 1

Author(s):

Laurent Kroely ◽

Sanjay K. Ram ◽

Pavel Bulkin ◽

Pere Roca i Cabarrocas

Keyword(s):

Solar Cells ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Silicon Films ◽

High Rate ◽

Microcrystalline Silicon