Characterization of titanium nitride films prepared by d.c. reactive magnetron sputtering at different nitrogen pressures
1997 ◽
Vol 90
(1-2)
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pp. 64-70
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Keyword(s):
2019 ◽
Vol 37
(2)
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pp. 021203
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1998 ◽
Vol 287-288
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pp. 267-268
2008 ◽
Vol 39
(11)
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pp. 1329-1330
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2004 ◽
Vol 145
(3)
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pp. 371-376
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2016 ◽
Vol 26
(4)
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pp. 889-894
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2011 ◽
Vol 13
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pp. 314-320
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2002 ◽
Vol 158-159
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pp. 685-689
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