Titanium Nitride - Silicon Nitride Composite Coatings Deposited by Reactive Magnetron Sputtering

1998 ◽  
Vol 287-288 ◽  
pp. 267-268
Author(s):  
Jörg Patscheider ◽  
M Diserens ◽  
F. Lévy
Keyword(s):  
Silicon Nitride ◽  
Magnetron Sputtering ◽  
Titanium Nitride ◽  
Composite Coatings ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron

scholarly journals RETRACTED ARTICLE: Nanocharacterization of Titanium Nitride Thin Films Obtained by Reactive Magnetron Sputtering

JOM ◽  
2015 ◽  
Vol 69 (8) ◽  
pp. 1455-1455
Author(s):  
Violeta Valentina Merie ◽  
Marius Sorin Pustan ◽  
Corina Bîrleanu ◽  
Gavril Negrea
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Titanium Nitride ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Retracted Article

Titanium nitride deposition on hardened high speed steel by reactive magnetron sputtering

1990 ◽  
Vol 190 (2) ◽  
pp. 265-277 ◽  
Author(s):  
M.Y. Al-Jaroudi ◽  
H.T.G. Hentzell ◽  
S.E. Hörnström ◽  
A. Bengtson
Keyword(s):  
Magnetron Sputtering ◽  
Titanium Nitride ◽  
High Speed ◽  
High Speed Steel ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron

Deposition of titanium nitride on surface-hardened structural steel by reactive magnetron sputtering

1989 ◽  
Vol 182 (1-2) ◽  
pp. 153-166 ◽  
Author(s):  
M.Y. Al-Jaroudi ◽  
H.T.G. Hentzell ◽  
S.E. Hörnström ◽  
A. Bengtson
Keyword(s):  
Magnetron Sputtering ◽  
Titanium Nitride ◽  
Structural Steel ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron

Characterization of Titanium Nitride Films Prepared by DC Reactive Magnetron Sputtering at Different Deposition Time

2007 ◽  
Author(s):  
Kai Yang ◽  
Jianqing Jiang ◽  
Mingyuan Gu
Keyword(s):  
Magnetron Sputtering ◽  
Film Thickness ◽  
Titanium Nitride ◽  
Deposition Time ◽  
Adhesive Property ◽  
Preferred Orientation ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Tin Films ◽  
Dc Reactive Magnetron Sputtering

Titanium nitride (TiN) films were grown on Si (111) and 95W18Cr4V high-speed steel substrates using DC reactive magnetron sputtering technique with different deposition time. The changes in crystal growth orientation of the TiN films were measured by X-ray diffraction (XRD). The surface & cross-sectional morphologies of TiN films were analyzed using field emission scanning electron microscopy (FESEM). The hardness and adhesive property of TiN films were evaluated as well. It is found that the increase of the film thickness favors the formation of the {111} preferred orientation of TiN films. When the {111} preferred orientation is presented, TiN films exhibit a kind of surface morphology of triangular pyramid with right angles. With the increase of the film thickness, the columnar grains continuously grow lengthwise and breadthwise. The size of grains influences the hardness of TiN films more greatly. The adhesive property of the film/substrate interface decreased with increasing film thickness.

Nitrogen emission in reactive magnetron sputtering plasmas during the deposition of titanium nitride thin film

2017 ◽  
Author(s):  
Nafarizal Nayan ◽  
Soo Ren How ◽  
Jais Lias ◽  
Mohd Khairul Ahmad ◽  
Mohd Zainizan Sahdan ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Titanium Nitride ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Nitrogen Emission
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