scholarly journals Polishing, chemical etching and thermal treatment effects on surface and electrical properties of Er and Nd-doped GaSb substrates

2000 ◽  
Vol 71 (1-3) ◽  
pp. 282-287 ◽  
Author(s):  
J.L Plaza ◽  
P Hidalgo ◽  
B Méndez ◽  
J Piqueras ◽  
E Diéguez
2004 ◽  
Vol 7 (2) ◽  
pp. 363-367 ◽  
Author(s):  
Antonio Leondino Bacichetti Junior ◽  
Manuel Henrique Lente ◽  
Ricardo Gonçalves Mendes ◽  
Pedro Iris Paulin Filho ◽  
José Antonio Eiras

2015 ◽  
Vol 47 ◽  
pp. 135-142 ◽  
Author(s):  
Flávia R.O. Silva ◽  
Nelson B. de Lima ◽  
Ana Helena A. Bressiani ◽  
Lilia C. Courrol ◽  
Laércio Gomes

2015 ◽  
Vol 157 ◽  
pp. 285-292 ◽  
Author(s):  
Laércio Gomes ◽  
Horácio Marconi da Silva M.D. Linhares ◽  
Rodrigo Uchida Ichikawa ◽  
Luis Gallego Martinez ◽  
Izilda Marcia Ranieri

2013 ◽  
Vol 39 ◽  
pp. S59-S63 ◽  
Author(s):  
Puripat Kantha ◽  
Nuttapon Pisitpipathsin ◽  
Kamonpan Pengpat

2013 ◽  
Vol 25 (8) ◽  
pp. 086001 ◽  
Author(s):  
Bratislav Antic ◽  
Marija Perovic ◽  
Aleksandar Kremenovic ◽  
Jovan Blanusa ◽  
Vojislav Spasojevic ◽  
...  

2019 ◽  
Vol 45 (17) ◽  
pp. 23203-23215 ◽  
Author(s):  
Nuengruethai Rukcharoen ◽  
Auttasit Tubtimtae ◽  
Veeramol Vailikhit ◽  
Pichanan Teesetsopon ◽  
Nareerat Kitisripanya

1987 ◽  
Vol 92 ◽  
Author(s):  
El-Hang Lee ◽  
M.Abdul Awal ◽  
E. Y. Chan ◽  
R. L. Opila ◽  
D. C. Jacobson ◽  
...  

ABSTRACTCharacteristics of MOCVD GaAs grown on Si are compared before and after a rapid thermal treatment. The GaAs-on-Si samples were prepared both with and without a Ge intermediate layer, which is used to accomodate mismatches of lattice, thermal and chemical origin between GaAs and Si. Structural, interfacial, chemical, and electrical changes have been examined. RBS and Raman characterization showed improvement of GaAs crystallinity after RTA. In most cases, the interfaces were found to become sharper after RTA, but chemical interdiffusion was observed to cause some effect on the structural and electrical properties. For gold-contacted GaAs, RTA seems to degrade the electrical and optoelectronic properties via gold interdiffusion into GaAs. Comparative studies of the GaAs/Si and GaAs/Ge/Si samples suggests that the two respond somewhat differently to RTA.


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