Growth of nanocrystalline diamond films by biased enhanced microwave plasma chemical vapor deposition

2001 ◽  
Vol 10 (9-10) ◽  
pp. 1592-1596 ◽  
Author(s):  
T. Sharda ◽  
T. Soga ◽  
T. Jimbo ◽  
M. Umeno
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Nanocrystalline Diamond ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Nanocrystalline Diamond Films

Thermal Stability of Nanocrystalline Diamond Films Grown by Microwave Plasma Chemical Vapor Deposition

2002 ◽  
Vol 750 ◽  
Author(s):  
Mevlut Bulut ◽  
Shane A. Catledge ◽  
Yogesh K. Vohra ◽  
Renato P. Camata
Keyword(s):  
Thermal Stability ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Nanocrystalline Diamond ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Nanocrystalline Diamond Films ◽  
Thermal Stability Of

ABSTRACTIn this work, the open-air thermal stability of nanocrystalline diamond films grown on mirror-polished titanium alloy substrates by the Microwave Plasma Chemical Vapor Deposition (MPCVD) technique was studied. The results of this investigation show that nanocrystalline diamond films are highly stable in air up to 600°C with no significant change in mechanical properties. Samples annealed between 600°C and 650°C, however, exhibit values of hardness lower by as much as 40% compared to as-grown samples. Above 650°C serious delamination effects were observed in the coatings.

NANOCRYSTALLINE DIAMOND FILMS ON HIGH SPEED STEEL BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION

2005 ◽  
Vol 04 (02) ◽  
pp. 213-227
Author(s):  
VITTAYA AMORNKITBAMRUNG ◽  
THANUSIT BURINPRAKHON ◽  
WIRAT JARERNBOON
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Speed ◽  
Microwave Plasma ◽  
Diamond Films ◽  
High Speed Steel ◽  
Chemical Vapor ◽  
Nanocrystalline Diamond ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition

Nanocrystalline diamond films were deposited on high speed steel substrates by microwave plasma chemical vapor deposition. The best hardness improvement was about 130% of the substrate hardness, using -150 V substrate bias deposition conditions. Raman peaks of nanocrystalline diamond at 1190 cm-1 and of graphite nanoclusters at 1522 cm-1 wereobserved in this sample. Scanning electron microscope images show crystallite grains of different sizes between 25–250 nm.

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