Improving Secondary Ion Mass Spectrometry C60n+Sputter Depth Profiling of Challenging Polymers with Nitric Oxide Gas Dosing

2013 ◽  
Vol 85 (10) ◽  
pp. 5064-5070 ◽  
Author(s):  
R. Havelund ◽  
A. Licciardello ◽  
J. Bailey ◽  
N. Tuccitto ◽  
D. Sapuppo ◽  
...  
Keyword(s):  
Nitric Oxide ◽  
Mass Spectrometry ◽  
Secondary Ion Mass Spectrometry ◽  
Depth Profiling ◽  
Ion Mass Spectrometry ◽  
Secondary Ion

Secondary ion mass spectrometry depth profiling of ultrashallow phosphorous in silicon

2000 ◽  
Vol 18 (1) ◽  
pp. 509 ◽  
Author(s):  
R. Loesing ◽  
G. M. Guryanov ◽  
J. L. Hunter ◽  
D. P. Griffis
Keyword(s):  
Mass Spectrometry ◽  
Secondary Ion Mass Spectrometry ◽  
Depth Profiling ◽  
Ion Mass Spectrometry ◽  
Secondary Ion

Secondary ion mass spectrometry depth profiling of 59Co implanted into nickel

2003 ◽  
Vol 207 (3) ◽  
pp. 339-344
Author(s):  
L VINCENT ◽  
T SAUVAGE ◽  
S HOUDAYER ◽  
C TESSIER ◽  
S GAUTROT ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Secondary Ion Mass Spectrometry ◽  
Depth Profiling ◽  
Ion Mass Spectrometry ◽  
Secondary Ion

Round-robin test for the measurement of layer thickness of multilayer films by secondary ion mass spectrometry depth profiling

2017 ◽  
Vol 49 (11) ◽  
pp. 1057-1063 ◽  
Author(s):  
Kyung Joong Kim ◽  
Jong Shik Jang ◽  
Joe Bennett ◽  
David Simons ◽  
Mario Barozzi ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Layer Thickness ◽  
Secondary Ion Mass Spectrometry ◽  
Depth Profiling ◽  
Multilayer Films ◽  
Round Robin ◽  
Round Robin Test ◽  
Ion Mass Spectrometry ◽  
Secondary Ion

The advantages of normal incidence ultra-low energy secondary ion mass spectrometry depth profiling

1999 ◽  
Vol 144-145 ◽  
pp. 292-296 ◽  
Author(s):  
T.J Ormsby ◽  
D.P Chu ◽  
M.G Dowsett ◽  
G.A Cooke ◽  
S.B Patel
Keyword(s):  
Mass Spectrometry ◽  
Secondary Ion Mass Spectrometry ◽  
Depth Profiling ◽  
Normal Incidence ◽  
Low Energy ◽  
Ion Mass Spectrometry ◽  
Secondary Ion

Sputter depth profiling by secondary ion mass spectrometry coupled with sample current measurements

2006 ◽  
Vol 252 (20) ◽  
pp. 7373-7382 ◽  
Author(s):  
U. Bardi ◽  
S.P. Chenakin ◽  
A. Lavacchi ◽  
C. Pagura ◽  
A. Tolstogouzov
Keyword(s):  
Mass Spectrometry ◽  
Secondary Ion Mass Spectrometry ◽  
Depth Profiling ◽  
Ion Mass Spectrometry ◽  
Secondary Ion
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