Secondary ion mass spectrometry depth profiling of ultrashallow phosphorous in silicon

Author(s):  
R. Loesing ◽  
G. M. Guryanov ◽  
J. L. Hunter ◽  
D. P. Griffis
2017 ◽  
Vol 49 (11) ◽  
pp. 1057-1063 ◽  
Author(s):  
Kyung Joong Kim ◽  
Jong Shik Jang ◽  
Joe Bennett ◽  
David Simons ◽  
Mario Barozzi ◽  
...  

2006 ◽  
Vol 252 (20) ◽  
pp. 7373-7382 ◽  
Author(s):  
U. Bardi ◽  
S.P. Chenakin ◽  
A. Lavacchi ◽  
C. Pagura ◽  
A. Tolstogouzov

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