Are cluster ion analysis beams good choices for hydrogen depth profiling using time-of-flight secondary ion mass spectrometry?

Zihua Zhu; Vaithiyalingam Shutthanandan

doi:10.1002/sia.3776

Are cluster ion analysis beams good choices for hydrogen depth profiling using time-of-flight secondary ion mass spectrometry?

Surface and Interface Analysis ◽

10.1002/sia.3776 ◽

2011 ◽

Vol 44 (1) ◽

pp. 89-93 ◽

Cited By ~ 10

Author(s):

Zihua Zhu ◽

Vaithiyalingam Shutthanandan

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Cluster Ion ◽

Secondary Ion ◽

Ion Analysis

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Three-Dimensional Image of Cleavage Bodies in Nuclei Is Configured Using Gas Cluster Ion Beam with Time-of-Flight Secondary Ion Mass Spectrometry

Scientific Reports ◽

10.1038/srep10000 ◽

2015 ◽

Vol 5 (1) ◽

Cited By ~ 4

Author(s):

Noritaka Masaki ◽

Itsuko Ishizaki ◽

Takahiro Hayasaka ◽

Gregory L. Fisher ◽

Noriaki Sanada ◽

...

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Ion Beam ◽

Three Dimensional ◽

Time Of Flight ◽

Dimensional Image ◽

Ion Mass Spectrometry ◽

Cluster Ion ◽

Gas Cluster Ion Beam ◽

Secondary Ion

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Time-of-flight secondary ion mass spectrometry depth profiling of multiple quantum well II–VI semiconductors using negative cluster ions

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590543 ◽

1999 ◽

Vol 17 (1) ◽

pp. 224 ◽

Cited By ~ 2

Author(s):

Jin Zhao ◽

Myunghee Na ◽

Patrick J. McKeown ◽

Huicheng Chang ◽

Eunhwa Lee ◽

...

Keyword(s):

Mass Spectrometry ◽

Quantum Well ◽

Secondary Ion Mass Spectrometry ◽

Multiple Quantum Well ◽

Time Of Flight ◽

Depth Profiling ◽

Cluster Ions ◽

Multiple Quantum ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Evaluation of sputtering induced surface roughness development of Ni/Cu multilayers thin films by Time-of-Flight Secondary Ion Mass Spectrometry depth profiling with different energies O2+ ion bombardment

Thin Solid Films ◽

10.1016/j.tsf.2018.10.049 ◽

2019 ◽

Vol 669 ◽

pp. 188-197

Author(s):

X.L. Yan ◽

M.M. Duvenhage ◽

J.Y. Wang ◽

H.C. Swart ◽

J.J. Terblans

Keyword(s):

Mass Spectrometry ◽

Thin Films ◽

Surface Roughness ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Ion Bombardment ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Systematic Temperature Effects in the Argon Cluster Ion Sputter Depth Profiling of Organic Materials Using Secondary Ion Mass Spectrometry

Journal of the American Society for Mass Spectrometry ◽

10.1007/s13361-016-1401-5 ◽

2016 ◽

Vol 27 (8) ◽

pp. 1411-1418 ◽

Cited By ~ 7

Author(s):

Martin P. Seah ◽

Rasmus Havelund ◽

Ian S. Gilmore

Keyword(s):

Mass Spectrometry ◽

Temperature Effects ◽

Organic Materials ◽

Secondary Ion Mass Spectrometry ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Cluster Ion ◽

Secondary Ion

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Quantitative depth profiling of Si1–xGex structures by time-of-flight secondary ion mass spectrometry and secondary neutral mass spectrometry

Thin Solid Films ◽

10.1016/j.tsf.2016.03.049 ◽

2016 ◽

Vol 607 ◽

pp. 25-31 ◽

Cited By ~ 3

Author(s):

M.N. Drozdov ◽

Y.N. Drozdov ◽

A. Csik ◽

A.V. Novikov ◽

K. Vad ◽

...

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Accurate argon cluster-ion sputter yields: Measured yields and effect of the sputter threshold in practical depth-profiling by x-ray photoelectron spectroscopy and secondary ion mass spectrometry

Journal of Applied Physics ◽

10.1063/1.4823815 ◽

2013 ◽

Vol 114 (12) ◽

pp. 124313 ◽

Cited By ~ 30

Author(s):

Peter J. Cumpson ◽

Jose F. Portoles ◽

Anders J. Barlow ◽

Naoko Sano

Keyword(s):

Mass Spectrometry ◽

Photoelectron Spectroscopy ◽

Secondary Ion Mass Spectrometry ◽

Depth Profiling ◽

X Ray ◽

Ion Mass Spectrometry ◽

Cluster Ion ◽

Secondary Ion

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Ultra-shallow depth profiling with time-of-flight secondary ion mass spectrometry

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587143 ◽

1994 ◽

Vol 12 (1) ◽

pp. 214 ◽

Cited By ~ 5

Author(s):

J. Bennett

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Shallow Depth ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Depth Profiling of Poly(l-lactic acid)/Triblock Copolymer Blends with Time-of-Flight Secondary Ion Mass Spectrometry

Analytical Chemistry ◽

10.1021/ac048274i ◽

2005 ◽

Vol 77 (11) ◽

pp. 3570-3578 ◽

Cited By ~ 40

Author(s):

Christine M. Mahoney ◽

Jinxiang Yu ◽

Joseph A. Gardella

Keyword(s):

Mass Spectrometry ◽

Lactic Acid ◽

Triblock Copolymer ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Copolymer Blends ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Quantitative depth profiling of ultra-shallow phosphorus implants in silicon using time-of-flight secondary ion mass spectrometry and the nuclear reaction 31P(α,p0)34S

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/j.nimb.2004.04.180 ◽

2004 ◽

Vol 225 (3) ◽

pp. 345-352 ◽

Cited By ~ 13

Author(s):

M.A. Bolorizadeh ◽

S. Ruffell ◽

I.V. Mitchell ◽

R. Gwilliam

Keyword(s):

Mass Spectrometry ◽

Nuclear Reaction ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Biological tissue imaging with time-of-flight secondary ion mass spectrometry and cluster ion sources

Journal of Mass Spectrometry ◽

10.1002/jms.902 ◽

2005 ◽

Vol 40 (8) ◽

pp. 985-999 ◽

Cited By ~ 182

Author(s):

Alain Brunelle ◽

David Touboul ◽

Olivier Laprévote

Keyword(s):

Mass Spectrometry ◽

Biological Tissue ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Ion Sources ◽

Tissue Imaging ◽

Ion Mass Spectrometry ◽

Cluster Ion ◽

Secondary Ion

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