scholarly journals Experimental Evidence for Two-Dimensional Ostwald Ripening in Semiconductor Nanoplatelets

2020 ◽  
Vol 32 (7) ◽  
pp. 3312-3319 ◽  
Author(s):  
Philippe N. Knüsel ◽  
Andreas Riedinger ◽  
Aurelio A. Rossinelli ◽  
Florian D. Ott ◽  
Aniket S. Mule ◽  
...  
2017 ◽  
Vol 15 (6) ◽  
pp. 062301 ◽  
Author(s):  
Yong Wang Yong Wang ◽  
Dengguo Zhang Dengguo Zhang ◽  
Shixiang Xu Shixiang Xu ◽  
Biaogang Xu Biaogang Xu ◽  
Zheng Dong Zheng Dong ◽  
...  

1996 ◽  
Vol 54 (16) ◽  
pp. 11741-11751 ◽  
Author(s):  
N. C. Bartelt ◽  
W. Theis ◽  
R. M. Tromp

2010 ◽  
Vol 55 (19) ◽  
pp. 5411-5413 ◽  
Author(s):  
Noelia B. Luque ◽  
Harald Ibach ◽  
Kay Pötting ◽  
Wolfgang Schmickler

2012 ◽  
Vol 108 (15) ◽  
Author(s):  
Patrick Vogt ◽  
Paola De Padova ◽  
Claudio Quaresima ◽  
Jose Avila ◽  
Emmanouil Frantzeskakis ◽  
...  

2000 ◽  
Vol 07 (05n06) ◽  
pp. 589-593 ◽  
Author(s):  
S. KODAMBAKA ◽  
V. PETROVA ◽  
A. VAILIONIS ◽  
P. DESJARDINS ◽  
D. G. CAHILL ◽  
...  

In-situ high-temperature scanning tunneling microscopy was used to follow the coarsening (Ostwald ripening) and decay kinetics of single and multiple two-dimensional TiN islands on atomically flat TiN (001) terraces and in single-atom deep vacancy pits at temperatures of 750–950°C. The rate-limiting mechanism for island decay was found to be surface diffusion rather than adatom attachment/detachment at island edges. We have modeled island-decay kinetics based upon the Gibbs–Thomson and steady state diffusion equations to obtain a step-edge energy per unit length of 0.23±0.05 eV/Å and an activation energy for adatom formation and diffusion of 3.4±0.3 eV.


Author(s):  
Koichiro Yaji ◽  
Yoshiyuki Ohtsubo ◽  
Shinichiro Hatta ◽  
Hiroshi Okuyama ◽  
Ryu Yukawa ◽  
...  

2004 ◽  
Vol 82 (10) ◽  
pp. 2931-2933 ◽  
Author(s):  
Mikito Kitayama ◽  
Kiyoshi Hirao ◽  
Motohiro Toriyama ◽  
Shuzo Kanzaki

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