Direct Optical Lithography of CsPbX3 Nanocrystals via Photoinduced Ligand Cleavage with Postpatterning Chemical Modification and Electronic Coupling

Nano Letters ◽  
2021 ◽  
Vol 21 (18) ◽  
pp. 7609-7616
Author(s):  
Jia-Ahn Pan ◽  
Justin C. Ondry ◽  
Dmitri V. Talapin
1996 ◽  
Vol 444 ◽  
Author(s):  
H. Okumoto ◽  
M. Shimomura ◽  
N. Minami ◽  
Y. Tanabe

AbstractSilicon-based polymers with σconjugated electrons have specific properties; photoreactivity for microlithography and photoconductivity for hole transport materials. To explore the possibility of combining these two properties to develop photoresists with electronic transport capability, photoconductivity of polysilanes is investigated in connection with their photoinduced chemical modification. Increase in photocurrent is observed accompanying photoreaction of poly(dimethylsilane) vacuum deposited films. This increase is found to be greatly enhanced in oxygen atmosphere. Such changes of photocurrent can be explained by charge transfer to electron acceptors from Si dangling bonds postulated to be formed during photoreaction.


1998 ◽  
Vol 13 (2) ◽  
pp. 124-131 ◽  
Author(s):  
Magnus Paulsson ◽  
Arthur J. Ragauskas

1996 ◽  
Vol 11 (2) ◽  
pp. 109-114 ◽  
Author(s):  
Magnus Paulsson ◽  
Shiming Li ◽  
Knut Lundquist ◽  
Rune Simonson ◽  
Ulla Westermark

1995 ◽  
Vol 10 (1) ◽  
pp. 62-67 ◽  
Author(s):  
Magnus Paulsson ◽  
Rune Sirnonson ◽  
Ulla Westermark

2008 ◽  
Vol 59 (1) ◽  
pp. 70-73
Author(s):  
Mihai Leonte ◽  
Traian Florea

The amyl graphic behaviour for products like carboxymetil starch obtained in different reaction conditions was looked into. The procedure specific feature is the chemical modification that takes place in a heterogeneous medium though the reaction of the reactant starch particle in indestructible conditions.


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