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2020 ◽  
Vol 2 (5) ◽  
pp. 1790-1799 ◽  
Author(s):  
Jerome Peter ◽  
Mohamad G. Moinuddin ◽  
Subrata Ghosh ◽  
Satinder K. Sharma ◽  
Kenneth E. Gonsalves
Keyword(s):  
Next Generation ◽  
Next Generation Lithography

Reduce process bias of photomask manufacturing for next-generation lithography

2004 ◽  
Author(s):  
Booky Lee ◽  
Sharon Wang ◽  
Toroy Tian ◽  
Samuel Yang ◽  
Roy Chen
Keyword(s):  
Next Generation ◽  
Next Generation Lithography

E-beam writing: a next-generation lithography approach for thin-film head critical features

2002 ◽  
Vol 38 (1) ◽  
pp. 95-100 ◽  
Author(s):  
R.E. Fontana ◽  
J. Katine ◽  
M. Rooks ◽  
R. Viswanathan ◽  
J. Lille ◽  
...  
Keyword(s):  
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Comparative Study of Ta and Its Compounds for Next Generation Lithography Mask Applications

2000 ◽  
Vol 37 (6) ◽  
pp. 1067
Author(s):  
Kim Kyoung Seok ◽  
Lee Seung Yoon ◽  
Park Chang Mo ◽  
Ahn Jinho
Keyword(s):  
Comparative Study ◽  
Next Generation ◽  
Next Generation Lithography
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