Flash photolysis of ozone in oxygen and oxygen + hydrogen mixtures. Kinetics of molecular oxygen(1.SIGMA.g+) + ozone and atomic oxygen(1D) + hydrogen reactions

1982 ◽  
Vol 86 (2) ◽  
pp. 238-242 ◽  
Author(s):  
P. J. Ogren ◽  
T. J. Sworski ◽  
C. J. Hochanadel ◽  
J. M. Cassel
Keyword(s):  
Molecular Oxygen ◽  
Atomic Oxygen ◽  
Flash Photolysis ◽  
Hydrogen Mixtures ◽  
Hydrogen Reactions ◽  
Kinetics Of

Oxidation Kinetics of Yba2Cu3OT7-x Thin Films in the Presence of Atomic Oxygen and Molecular Oxygen by In-Situ Resistivity Measurement

1991 ◽  
Vol 230 ◽  
Author(s):  
K. Yamamoto ◽  
B. M. Lairson ◽  
J. C. Bravman ◽  
T. H. Geballe
Keyword(s):  
Thin Films ◽  
Molecular Oxygen ◽  
Atomic Oxygen ◽  
Resistivity Measurement ◽  
Oxygen Stoichiometry ◽  
Ambient Conditions ◽  
Kinetics Of Oxidation ◽  
Thermally Activated ◽  
Kinetics Of

AbstractThe kinetics of oxidation in Yba2Cu3O7-x thin films in the presence of molecular and atomic oxygen ambients have been studied. The resistivity of c-axis, a-axis, and mixed a+c axis oriented films, deposited in-situ by off-axis magnetron sputtering, was measured as a function of time subsequent to a change in the ambient conditions. The oxidation process is shown to be thermally activated and can be characterized by a diffusion model with an activation energy which varies from approximately 1.2eV in the presence of molecular oxygen to 0.6eV for a flux of 2×1015 oxygen atoms/cm2sec. In both cases, diffusivity is found to be insensitive to oxygen stoichiometry, but the rate of oxidation is found to be sensitive to the microstructure and orientation of the films.

Oxidation kinetics of YBa2Cu3O7−xthin films in the presence of atomic oxygen and molecular oxygen byin‐situresistivity measurements

1991 ◽  
Vol 69 (10) ◽  
pp. 7189-7201 ◽  
Author(s):  
K. Yamamoto ◽  
B. M. Lairson ◽  
J. C. Bravman ◽  
T. H. Geballe
Keyword(s):  
Molecular Oxygen ◽  
Oxidation Kinetics ◽  
Atomic Oxygen ◽  
Kinetics Of
Sign in / Sign up

Export Citation Format

Share Document