scholarly journals Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition

2006 ◽  
Vol 128 (34) ◽  
pp. 11018-11019 ◽  
Author(s):  
Ying-Bing Jiang ◽  
Nanguo Liu ◽  
Henry Gerung ◽  
Joseph L. Cecchi ◽  
C. Jeffrey Brinker
2012 ◽  
Vol 1 (2) ◽  
pp. P42-P44 ◽  
Author(s):  
S. Armini ◽  
J. L. Prado ◽  
J. Swerts ◽  
Y. Sun ◽  
M. Krishtab ◽  
...  

Nano Letters ◽  
2020 ◽  
Vol 20 (9) ◽  
pp. 6884-6890
Author(s):  
Wang Ke ◽  
Yang Liu ◽  
Xuelong Wang ◽  
Xiangdong Qin ◽  
Limei Chen ◽  
...  

RSC Advances ◽  
2020 ◽  
Vol 10 (57) ◽  
pp. 34333-34343
Author(s):  
D. Beitner ◽  
I. Polishchuk ◽  
E. Asulin ◽  
B. Pokroy

A process of atomic layer deposition (ALD) combined with self-assembled monolayers (SAMs) was used to investigate the possible modification of polyurethane (PUR) paint surface wetting properties without altering their original hue.


2010 ◽  
Vol 518 (15) ◽  
pp. 4126-4130 ◽  
Author(s):  
Kibyung Park ◽  
Younghwan Lee ◽  
Kyung Taek Im ◽  
June Young Lee ◽  
Sangwoo Lim

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