Application of hard and soft acid base theory to uncover Lewis bases’ destructiveness to UiO-66 type metal organic frameworks in aqueous solutions

2021 ◽  
Author(s):  
Liangjie Wang ◽  
Juan Li ◽  
Luyao Cheng ◽  
Yonghui Song ◽  
Ping Zeng ◽  
...  
Keyword(s):  
Wastewater Treatment ◽  
Aqueous Solutions ◽  
Metal Organic Frameworks ◽  
Acid Base ◽  
Lewis Bases ◽  
Base Theory ◽  
Metal Organic ◽  
The Stability ◽  
Soft Acid

Lewis bases (L-bases) in wastewater, such as F- and PO43-, are destructive to the stability of MOFs which have attracted increasing attentions in wastewater treatment field as adsorbents and catalysts....

scholarly journals Solvent-Dependent Stability of Highly Defective UiO-66 to Acids and Bases

2021 ◽  
Author(s):  
Daniele Cartagenova ◽  
Fabio A. Peixoto Esteves ◽  
Nathan T. Fischer ◽  
Jeroen A. van Bokhoven ◽  
Marco Ranocchiari
Keyword(s):  
Organic Solvents ◽  
Crystalline Structure ◽  
Metal Organic Frameworks ◽  
Textural Properties ◽  
Systematic Investigation ◽  
Acid Base ◽  
Metal Organic ◽  
Acids And Bases ◽  
The Stability ◽  
Strong Acids

UiO-66 is one of the most chemically stable Metal-organic frameworks (MOFs) available. However, little is known about its stability in organic solvents. In this study, we synthesized a highly defective UiO-66 (HD-UiO-66) and explored how its textural properties change when exposed to weak and strong acids, both organic and inorganic in nature, and dissolved in different solvents, water, dichloromethane (DCM), and tetrahydrofuran (THF). Exposing defective UiO-66 to weak acids and bases, such as acetic acid and triethylamine, maintains its crystalline structure and porosity, irrespective of the solvent. Sulphuric acid decomposes HD-UiO-66 in organic solvents but not in water, trifluoroacetic acid decomposes the framework only in DCM. Tetramethylguanidine decomposes HD-UiO-66 in organic solvents but mantains some of the MOFs porosity and crystalline structure in water, whereas potassium carbonate damages the MOF to a greater extent in water than in organic solvents. Our results show that the acid/base properties of the solvent modulate the strength of acids and bases and its polarity determines the extent of their solvation, thus playing a crucial role in altering the MOF’s textural properties. This systematic investigation highlights the central role played by the solvent in tuning the stability of MOFs, which is relevant for liquid-phase applications in acidic and basic environments, such as catalysis and adsorption.

scholarly journals Solvent-Dependent Stability of Highly Defective UiO-66 to Acids and Bases

2021 ◽  
Author(s):  
Daniele Cartagenova ◽  
Fabio A. Peixoto Esteves ◽  
Nathan T. Fischer ◽  
Jeroen A. van Bokhoven ◽  
Marco Ranocchiari
Keyword(s):  
Organic Solvents ◽  
Crystalline Structure ◽  
Metal Organic Frameworks ◽  
Textural Properties ◽  
Systematic Investigation ◽  
Acid Base ◽  
Metal Organic ◽  
Acids And Bases ◽  
The Stability ◽  
Strong Acids

UiO-66 is one of the most chemically stable Metal-organic frameworks (MOFs) available. However, little is known about its stability in organic solvents. In this study, we synthesized a highly defective UiO-66 (HD-UiO-66) and explored how its textural properties change when exposed to weak and strong acids, both organic and inorganic in nature, and dissolved in different solvents, water, dichloromethane (DCM), and tetrahydrofuran (THF). Exposing defective UiO-66 to weak acids and bases, such as acetic acid and triethylamine, maintains its crystalline structure and porosity, irrespective of the solvent. Sulphuric acid decomposes HD-UiO-66 in organic solvents but not in water, trifluoroacetic acid decomposes the framework only in DCM. Tetramethylguanidine decomposes HD-UiO-66 in organic solvents but mantains some of the MOFs porosity and crystalline structure in water, whereas potassium carbonate damages the MOF to a greater extent in water than in organic solvents. Our results show that the acid/base properties of the solvent modulate the strength of acids and bases and its polarity determines the extent of their solvation, thus playing a crucial role in altering the MOF’s textural properties. This systematic investigation highlights the central role played by the solvent in tuning the stability of MOFs, which is relevant for liquid-phase applications in acidic and basic environments, such as catalysis and adsorption.

scholarly journals Solvent-Dependent Stability of Highly Defective UiO-66 to Acids and Bases

2021 ◽  
Author(s):  
Daniele Cartagenova ◽  
Fabio A. Peixoto Esteves ◽  
Nathan T. Fischer ◽  
Jeroen A. van Bokhoven ◽  
Marco Ranocchiari
Keyword(s):  
Organic Solvents ◽  
Crystalline Structure ◽  
Metal Organic Frameworks ◽  
Textural Properties ◽  
Systematic Investigation ◽  
Acid Base ◽  
Metal Organic ◽  
Acids And Bases ◽  
The Stability ◽  
Strong Acids

UiO-66 is one of the most chemically stable Metal-organic frameworks (MOFs) available. However, little is known about its stability in organic solvents. In this study, we synthesized a highly defective UiO-66 (HD-UiO-66) and explored how its textural properties change when exposed to weak and strong acids, both organic and inorganic in nature, and dissolved in different solvents, water, dichloromethane (DCM), and tetrahydrofuran (THF). Exposing defective UiO-66 to weak acids and bases, such as acetic acid and triethylamine, maintains its crystalline structure and porosity, irrespective of the solvent. Sulphuric acid decomposes HD-UiO-66 in organic solvents but not in water, trifluoroacetic acid decomposes the framework only in DCM. Tetramethylguanidine decomposes HD-UiO-66 in organic solvents but mantains some of the MOFs porosity and crystalline structure in water, whereas potassium carbonate damages the MOF to a greater extent in water than in organic solvents. Our results show that the acid/base properties of the solvent modulate the strength of acids and bases and its polarity determines the extent of their solvation, thus playing a crucial role in altering the MOF’s textural properties. This systematic investigation highlights the central role played by the solvent in tuning the stability of MOFs, which is relevant for liquid-phase applications in acidic and basic environments, such as catalysis and adsorption.

Heteroaggregation behavior of graphene oxide on Zr-based metal–organic frameworks in aqueous solutions: a combined experimental and theoretical study

2017 ◽  
Vol 5 (38) ◽  
pp. 20398-20406 ◽  
Author(s):  
Jie Li ◽  
Qunyan Wu ◽  
Xiangxue Wang ◽  
Zhifang Chai ◽  
Weiqun Shi ◽  
...  
Keyword(s):  
Hydrogen Bonding ◽  
Graphene Oxide ◽  
Aqueous Solutions ◽  
Theoretical Study ◽  
Metal Organic Frameworks ◽  
Acid Base ◽  
Π Interactions ◽  
Metal Organic

Electrostatic attractions combined with the non-negligible π–π interactions, hydrogen bonding and acid–base interactions lead to the heteroaggregation between GO and Zr based MOFs.

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