Suppression of hard bubbles in magnetic garnet films by ion implantation: Dependence on ion species, dose, energy, and annealing

1973 ◽  
Vol 22 (12) ◽  
pp. 683-685 ◽  
Author(s):  
R. Wolfe ◽  
J.C. North ◽  
Y.P. Lai
1990 ◽  
Author(s):  
G. Schueer ◽  
D. Kollewe ◽  
Horst Doetsch ◽  
A. Brockmeyer

2002 ◽  
Vol 716 ◽  
Author(s):  
Alok Nandini ◽  
U. Roy ◽  
A. Mallikarjunan ◽  
A. Kumar ◽  
J. Fortin ◽  
...  

AbstractThin films of low dielectric constant (κ) materials such as Xerogel (ĸ=1.76) and SilkTM (ĸ=2.65) were implanted with argon, neon, nitrogen, carbon and helium with 2 x 1015 cm -2 and 1 x 1016 cm -2 dose at energies varying from 50 to 150 keV at room temperature. In this work we discuss the improvement of hardness as well as elasticity of low ĸ dielectric materials by ion implantation. Ultrasonic Force Microscopy (UFM) [6] and Nano indentation technique [5] have been used for qualitative and quantitative measurements respectively. The hardness increased with increasing ion energy and dose of implantation. For a given energy and dose, the hardness improvement varied with ion species. Dramatic improvement of hardness is seen for multi-dose implantation. Among all the implanted ion species (Helium, Carbon, Nitrogen, Neon and Argon), Argon implantation resulted in 5x hardness increase in Xerogel films, sacrificing only a slight increase (∼ 15%) in dielectric constant.


1972 ◽  
Vol 21 (12) ◽  
pp. 581-584 ◽  
Author(s):  
J.J. Cuomo ◽  
V. Sadagopan ◽  
J. DeLuca ◽  
P. Chaudhari ◽  
R. Rosenberg

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