Anomalous negative bias temperature instability behavior in p-channel metal-oxide-semiconductor field-effect transistors with HfSiON∕SiO2 gate stack

2007 ◽  
Vol 90 (23) ◽  
pp. 233505
Author(s):  
Shih-Chang Chen ◽  
Chao-Hsin Chien ◽  
Jen-Chung Lou
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