negative bias temperature instability
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2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Stephan Adolf ◽  
Wolfgang Nebel

Abstract Negative Bias Temperature Instability (NBTI) is one of the major transistor aging effects, possibly leading to timing failures during run-time of a system. Thus one is interested in predicting this effect during design time. In this work an Abstraction NBTI model is introduced reducing the state space of trap-based NBTI models using two abstraction parameters, applying a state transformation to incorporate variable stress conditions. This transformation is faster than traditional approaches. Currently the conversion into estimated threshold voltage damages is a very time consuming process.


2021 ◽  
Author(s):  
Marcs Ng

A voltage-mode transmitter using a 1.8V-to-3.3V levelshifter and cascoded output buffer is proposed. 1.8V TSMC 65nm transistors are used. The design is targeted to meet JEDEC Interface Standard for Nominal 3 V/3.3 V Supply Digital Integrated Circuits DC Specifications as well as an AC transmission rate of 200 MHz on a 30 cm 50Ω board trace terminated with a 4 pF capacitive load. Overstress voltages will not be exceeded in order to avoid device failure due to breaching Gate Oxide Integrity, Hot Carrier Injection, or Negative Bias Temperature Instability.


2021 ◽  
Author(s):  
Marcs Ng

A voltage-mode transmitter using a 1.8V-to-3.3V levelshifter and cascoded output buffer is proposed. 1.8V TSMC 65nm transistors are used. The design is targeted to meet JEDEC Interface Standard for Nominal 3 V/3.3 V Supply Digital Integrated Circuits DC Specifications as well as an AC transmission rate of 200 MHz on a 30 cm 50Ω board trace terminated with a 4 pF capacitive load. Overstress voltages will not be exceeded in order to avoid device failure due to breaching Gate Oxide Integrity, Hot Carrier Injection, or Negative Bias Temperature Instability.


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