A particle-in-cell plus Monte Carlo study of plasma-induced damage of normal incidence collector optics used in extreme ultraviolet lithography
2012 ◽
Vol 51
(8R)
◽
pp. 086504
◽
2012 ◽
Vol 51
◽
pp. 086504
◽
2010 ◽
Vol 87
(11)
◽
pp. 2134-2138
◽
2005 ◽
Vol 44
(7B)
◽
pp. 5560-5564
◽
Keyword(s):
2011 ◽
Vol 29
(1)
◽
pp. 011022
◽