Full 3D Monte Carlo simulation of pit-type defect evolution during extreme ultraviolet lithography multilayer deposition

2013 ◽  
Vol 540 ◽  
pp. 173-182 ◽  
Author(s):  
Robert F. Spivey ◽  
Ranganath Teki ◽  
T.-M. Lu
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Multilayer Deposition ◽  
Ultraviolet Lithography ◽  
Type Defect ◽  
Defect Evolution ◽  
3D Monte Carlo

Backbone Degradable Poly(aryl acetal) Photoresist Polymers: Synthesis, Acid Sensitivity, and Extreme Ultraviolet Lithography Performance

2019 ◽  
Vol 52 (3) ◽  
pp. 886-895 ◽  
Author(s):  
Matthias S. Ober ◽  
Duane R. Romer ◽  
John Etienne ◽  
P. J. Thomas ◽  
Vipul Jain ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Acid Sensitivity

Demonstration of phase-shift masks for extreme-ultraviolet lithography

2006 ◽  
Author(s):  
Bruno La Fontaine ◽  
Adam R. Pawloski ◽  
Obert Wood ◽  
Yunfei Deng ◽  
Harry J. Levinson ◽  
...  
Keyword(s):  
Phase Shift ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography

scholarly journals OptogenSIM: a 3D Monte Carlo simulation platform for light delivery design in optogenetics

2015 ◽  
Vol 6 (12) ◽  
pp. 4859 ◽  
Author(s):  
Yuming Liu ◽  
Steven L. Jacques ◽  
Mehdi Azimipour ◽  
Jeremy D. Rogers ◽  
Ramin Pashaie ◽  
...  
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Simulation Platform ◽  
Light Delivery ◽  
3D Monte Carlo

Influence of MEEF change on the mask shadowing effect in extreme ultraviolet lithography

2010 ◽  
Vol 87 (11) ◽  
pp. 2134-2138 ◽  
Author(s):  
Chang Young Jeong ◽  
Sangsul Lee ◽  
Hyun-Duck Shin ◽  
Tae Geun Kim ◽  
Jinho Ahn
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Shadowing Effect
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