Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions

2008 ◽  
Vol 92 (20) ◽  
pp. 201501 ◽  
Author(s):  
André Anders
2018 ◽  
Vol 352 ◽  
pp. 680-689 ◽  
Author(s):  
Wahyu Diyatmika ◽  
Fei-Ke Liang ◽  
Bih-Show Lou ◽  
Jong-Hong Lu ◽  
De-En Sun ◽  
...  

2017 ◽  
Vol 24 (12) ◽  
pp. 123501 ◽  
Author(s):  
G. Yu. Yushkov ◽  
A. G. Nikolaev ◽  
V. P. Frolova ◽  
E. M. Oks ◽  
A. G. Rousskikh ◽  
...  

2019 ◽  
Vol 688 ◽  
pp. 137353 ◽  
Author(s):  
Behnam Akhavan ◽  
Rajesh Ganesan ◽  
Michael Stueber ◽  
Sven Ulrich ◽  
David R. McKenzie ◽  
...  

2016 ◽  
Vol 82 (6) ◽  
Author(s):  
S. Cuynet ◽  
T. Lecas ◽  
A. Caillard ◽  
P. Brault

The proportion of metal ions in a high power impulse magnetron sputtering discharge is key information for the potential development of new materials and new layer architectures deposited by this technique. This paper aims to measure this proportion by using a homemade system consisting of a quartz crystal microbalance and a grid energy analyser assembly. Such a system yields relevant results on the composition of the post-discharge depending on the nature of the gas (Ar, Kr, Xe) and the target materials (Pt, Pd, Au, $\text{Pt}_{50}\text{Au}_{50}$ and $\text{Pt}_{5}\text{Pd}_{95}$). In our conditions, the highest proportion of metal ions in the post-discharge are obtained by using Ar gas and reaches 10 %, 12 %, 50 %, 19 % and 88 % for Pt, Au, Pd, $\text{Pt}_{50}\text{Au}_{50}$ and $\text{Pt}_{5}\text{Pd}_{95}$ targets, respectively.


2018 ◽  
Vol 54 (6) ◽  
pp. 78-93
Author(s):  
V. V. Grubinko ◽  
O. I. Bodnar ◽  
A. I. Lutsiv ◽  
G. B. Viniarska
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