Influence of annealing temperature and thickness of a CoFeB middle layer on the tunnel magnetoresistance of MgO based double barrier magnetic tunnel junctions

2009 ◽  
Vol 105 (1) ◽  
pp. 014510 ◽  
Author(s):  
A. Reinartz ◽  
J. Schmalhorst ◽  
G. Reiss
2005 ◽  
Vol 86 (8) ◽  
pp. 082501 ◽  
Author(s):  
T. Nozaki ◽  
A. Hirohata ◽  
N. Tezuka ◽  
S. Sugimoto ◽  
K. Inomata

2009 ◽  
Vol 105 (3) ◽  
pp. 033916 ◽  
Author(s):  
G. Feng ◽  
Sebastiaan van Dijken ◽  
J. F. Feng ◽  
J. M. D. Coey ◽  
T. Leo ◽  
...  

2005 ◽  
Vol 72 (5) ◽  
Author(s):  
Zhong-Ming Zeng ◽  
Xiu-Feng Han ◽  
Wen-Shan Zhan ◽  
Yong Wang ◽  
Ze Zhang ◽  
...  

2012 ◽  
Vol 190 ◽  
pp. 145-148
Author(s):  
A. Useinov ◽  
C. Gooneratne ◽  
J. Kosel

In this paper, we study the value of the tunnel magnetoresistance (TMR) as a function of the applied voltage in double barrier magnetic tunnel junctions (DMTJs) with the left and right ferromagnetic (FM) layers being pinned and numerically estimate the possible difference of the TMR curves for negative and positive voltages in the homojunctions (equal barriers and electrodes). DMTJs are modeled as two single barrier junctions connected in series with consecutive tunneling (CST). We investigated the asymmetric voltage behavior of the TMR for the CST in the range of a general theoretical model. Significant asymmetries of the experimental curves, which arise due to different annealing regimes, are mostly explained by different heights of the tunnel barriers and asymmetries of spin polarizations in magnetic layers.


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