Development of large volume double ring penning plasma discharge source for efficient light emissions

2012 ◽  
Vol 83 (12) ◽  
pp. 123502 ◽  
Author(s):  
Ram Prakash ◽  
Gheesa Lal Vyas ◽  
Jalaj Jain ◽  
Jitendra Prajapati ◽  
Udit Narayan Pal ◽  
...  
Keyword(s):  
Large Volume ◽  
Plasma Discharge ◽  
Double Ring ◽  
Discharge Source

Atmospheric-pressure argon/oxygen plasma-discharge source with a stepped electrode

2007 ◽  
Vol 90 (5) ◽  
pp. 051504 ◽  
Author(s):  
Jin-Pyo Lim ◽  
Han S. Uhm ◽  
Shou-Zhe Li
Keyword(s):  
Atmospheric Pressure ◽  
Oxygen Plasma ◽  
Plasma Discharge ◽  
Discharge Source

Kinetic study of instability growth rate in a helicon plasma discharge source

2017 ◽  
Vol 57 (6-7) ◽  
pp. 272-281
Author(s):  
Rokhsare Jaafarian ◽  
Alireza Ganjovi ◽  
Gholam Reza Etaati
Keyword(s):  
Growth Rate ◽  
Kinetic Study ◽  
Plasma Discharge ◽  
Instability Growth Rate ◽  
Helicon Plasma ◽  
Discharge Source ◽  
Instability Growth

Progress in the characterization of nanophase diamond films uniquely produced by a laser plasma discharge source

1993 ◽  
Vol 62 (1-3) ◽  
pp. 564-569 ◽  
Author(s):  
F. Davanloo ◽  
T.J. Lee ◽  
J.H. You ◽  
H. Park ◽  
C.B. Collins
Keyword(s):  
Laser Plasma ◽  
Diamond Films ◽  
Plasma Discharge ◽  
Discharge Source

High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography

1999 ◽  
Author(s):  
William T. Silfvast ◽  
M. Klosner ◽  
Gregory M. Shimkaveg ◽  
Howard Bender ◽  
Glenn D. Kubiak ◽  
...  
Keyword(s):  
High Power ◽  
Plasma Discharge ◽  
Discharge Source ◽  
Euv Lithography

scholarly journals Intense plasma discharge source at 135 nm for extreme-ultraviolet lithography

1997 ◽  
Vol 22 (1) ◽  
pp. 34 ◽  
Author(s):  
M. A. Klosner ◽  
H. A. Bender ◽  
W. T. Silfvast ◽  
J. J. Rocca
Keyword(s):  
Extreme Ultraviolet ◽  
Plasma Discharge ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Discharge Source
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