GaInAsP/InP stripe lasers with etched mirrors fabricated by a wet chemical etch

Applied Physics Letters ◽

10.1063/1.91939 ◽

1980 ◽

Vol 37 (4) ◽

pp. 339-341 ◽

Author(s):

B. I. Miller ◽

K. Iga

Keyword(s):

Chemical Etch ◽

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Wet Chemical Etch

10.1007/springerreference_67926 ◽

2011 ◽

Keyword(s):

Chemical Etch ◽

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The influence of varying sputter deposition conditions on the wet chemical etch rate of AlN thin films

10.1117/12.721686 ◽

2007 ◽

Author(s):

A. Ababneh ◽

H. Kreher ◽

H. Seidel ◽

U. Schmid

Keyword(s):

Etch Rate ◽

Sputter Deposition ◽

Chemical Etch ◽

Wet Chemical ◽

Deposition Conditions

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Novel wet chemical etch for nanostructures based on II-VI compounds

Applied Physics Letters ◽

10.1063/1.119593 ◽

1997 ◽

Vol 71 (4) ◽

pp. 509-511 ◽

Author(s):

A. Osinsky ◽

Y. Qiu ◽

J. Mahan ◽

H. Temkin ◽

S. A. Gurevich ◽

...

Keyword(s):

Chemical Etch ◽

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Analyses and Modeling of a Wet-Chemical-Etch Process on Rotating Silicon Wafers with an Impinging Etchant Jet

Journal of The Electrochemical Society ◽

10.1149/1.3090176 ◽

2009 ◽

Vol 156 (5) ◽

pp. H340 ◽

Author(s):

F. Staudegger ◽

M. W. Hofbaur ◽

H.-J. Kruwinus

Keyword(s):

Silicon Wafers ◽

Chemical Etch ◽

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Fabrication of black silicon anti-reflection via nanocatalytic wet-chemical etch

Molecular Crystals and Liquid Crystals ◽

10.1080/15421406.2016.1277470 ◽

2017 ◽

Vol 644 (1) ◽

pp. 169-174 ◽

Author(s):

Van Thi Thanh Ho ◽

Bach Long Giang ◽

Lu-Sheng Hong ◽

Nam Giang Nguyen

Keyword(s):

Black Silicon ◽

Chemical Etch ◽

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Extended microtunnels in GaN prepared by wet chemical etch

Applied Physics Letters ◽

10.1063/1.2374841 ◽

2006 ◽

Vol 89 (20) ◽

pp. 202115 ◽

Author(s):

Hsin-Hsiung Huang ◽

Hung-Yu Zeng ◽

Chi-Ling Lee ◽

Shih-Chang Lee ◽

Wei-I Lee

Keyword(s):

Chemical Etch ◽

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Methods for Defect Evaluation of Thin Oriented Silicon Epitaxial Layers Using a Wet Chemical Etch

Journal of The Electrochemical Society ◽

10.1149/1.2124371 ◽

1982 ◽

Vol 129 (9) ◽

pp. 2074-2076 ◽

Author(s):

Vance D. Archer

Keyword(s):

Epitaxial Layers ◽

Chemical Etch ◽

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Wet Chemical Etch

Encyclopedia of Microfluidics and Nanofluidics ◽

10.1007/978-0-387-48998-8_1692 ◽

2008 ◽

pp. 2185-2185

Keyword(s):

Chemical Etch ◽

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Wet Chemical Etch

Encyclopedia of Microfluidics and Nanofluidics ◽

10.1007/978-1-4614-5491-5_200310 ◽

2015 ◽

pp. 3488-3488

Keyword(s):

Chemical Etch ◽

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BGA Package Level Failures Due to Contamination

ISTFA 2007: Conference Proceedings from the 33rd International Symposium for Testing and Failure Analysis ◽

10.31399/asm.cp.istfa2007p0236 ◽

2007 ◽

Author(s):

Jodi Roepsch

Keyword(s):

Analytical Techniques ◽

Plasma Etch ◽

Nickel Carbonate ◽

Optical Inspection ◽

Chemical Etch ◽

Board Surface ◽

Bga Package ◽

Abstract Two instances of BGA package level failures were identified during in-circuit electrical test. The electrical opens occurred as a result of contamination issues originating at the board supplier. Analytical techniques including optical inspection, SEM/EDS, Raman and FTIR were key in identifying photoresist on the board surface in the first case study and nickel carbonate contamination on the board surface in the second case study. In the first case study, resolution was achieved with a Plasma etch process. In the second case study, CCAs were cleaned with a wet chemical etch process formulated specifically to attack the nickel carbonate.

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