On the Flat-Band Potential and the Frequency Dispersion of Capacitance and Its Removal in an Normal-Cadmium Telluride in Alkaline Selenide, Polyselenide Photoelectrochemical Cell

1986 ◽  
Vol 39 (2) ◽  
pp. 347
Author(s):  
LE Lyons ◽  
TL Young

When seepage of the electrolyte between the semiconductor crystal and its insulation was prevented, the equivalent series capacitance CS of an n-CdTe|Se2-, Sen2-,OH-|Pt cell was almost independent of frequency (<2% increase of CS per decade decrease of frequency) in the range 104-2 Hz. Attributing CS wholly to the space-charge capacitance resulted in a linear Mott- Schottky plot and this yielded a flat-band potential of -2.0�0.1 V v . s.c.e . and a built-in potential of 1.08�0.06 V. This was consistent with the observed current-voltage curves in both dark and light. Two conditions under which frequency dispersion was observed were (a) electrolyte seepage and (b) surface damage. The insulating techniques which allowed seepage were similar to those of other workers. The effects of these imperfections on the Mott- Schottky plot are considered. Attempts to extract useful information from frequency dispersion data showed that it is difficult or impossible to obtain a unambiguous equivalent circuit solely on the basis of goodness-of-fit of calculated to observed impedances. The ambiguity can be removed only when sufficient information beyond impedance-frequency data is available. For electrodes with seepage, a model due to Tomkiewicz led to the correct value of the built-in potential.

2015 ◽  
Vol 3 (15) ◽  
pp. 7959-7965 ◽  
Author(s):  
M. Barawi ◽  
E. Flores ◽  
I. J. Ferrer ◽  
J. R. Ares ◽  
C. Sánchez

Flat band potential of TiS3 in a photoelectrochemical cell is determined and the photogenerated hydrogen is quantified by mass spectrometry.


2019 ◽  
Author(s):  
Kunjal Patel ◽  
G. K. Solanki ◽  
K. D. Patel ◽  
Pratik Pataniya ◽  
V. M. Pathak ◽  
...  

1988 ◽  
Vol 110 (1) ◽  
pp. 293-299 ◽  
Author(s):  
R. Srivastava ◽  
V. M. Pathak ◽  
V. V. Rao

1989 ◽  
Vol 67 (3) ◽  
pp. 382-388 ◽  
Author(s):  
O. Savadogo

Modification of several semiconductors material surfaces with H4SiW12O40•nH2O have been carried out to produce an increase in the open circuit photopotential at the semiconductor/electrolyte interface (Voc) without changing the flat-band potential. The augmentation of Voc is shown to be attributed to a decrease of the minority carriers recombination at the semiconductor/electrolyte interface along with the suppression of Fermi level pinning. The enhancement of Voc and the electrocatalytic activity of the hydrogen evolution reaction in acidic medium of the derivatized electrodes is attributed to the Fermi level unpinning. Keywords: photoelectrodes, photoelectrocatalysis, pinning, modification improvement.


2018 ◽  
Vol 2 (9) ◽  
pp. 2053-2059 ◽  
Author(s):  
Xiaorong Liang ◽  
Jiale Xie ◽  
Jinyun Xiong ◽  
Liangping Gong ◽  
Chang Ming Li

A FeCoW multimetal oxide-coated W:BiVO4 photoanode performs a 3.8 times photocurrent and a negative shift of the flat-band potential by 280 mV in comparison to a W:BiVO4 photoanode.


1983 ◽  
Vol 28 (8) ◽  
pp. 1063-1066 ◽  
Author(s):  
Maheshwar Sharon ◽  
Ashwani Sinha

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