Metastable defect states in hydrogen-implanted silicon

1983 ◽  
Vol 71 (1-2) ◽  
pp. 1-8 ◽  
Author(s):  
Yu. V. Gorelkinskii ◽  
N. N. Nevinnyi
2018 ◽  
Vol 112 (8) ◽  
pp. 081102 ◽  
Author(s):  
F. Lang ◽  
O. Shargaieva ◽  
V. V. Brus ◽  
J. Rappich ◽  
N. H. Nickel

2010 ◽  
Vol 1245 ◽  
Author(s):  
Arno H.M. Smets ◽  
Chris R. Wronski ◽  
Miro Zeman ◽  
M. van de Sanden

AbstractIn the recent years more and more theoretical and experimental evidence have been found that the hydrogen bonded to silicon in dense hydrogenated amorphous silicon (a-Si:H) predominantly resides in hydrogenated divacancies. In this contribution we will philosophize about the option that the small fraction of divacancies, missing at least one of its bonded hydrogen, may correspond to some of the native and metastable defect states of a-Si:H. We will discuss that such defect entities are an interesting basis for new and alternative views on the origin of the SWE.


1989 ◽  
Vol 149 ◽  
Author(s):  
R. A Street ◽  
K. Winer

ABSTRACTMeasurements are reported of metastable defect states in undoped a-Si: H, with the aim of understanding the relation between the different types of metastability. The temperature dependence of the thermal equilibrium defect density agrees well with a proposed thermodynamic model and their relaxation time varies with deposition conditions. The rate of light induced defect creation and annealing in samples deposited at low temperature and with a large initial defect density, decreases progressively as the irreversible defects are removed by annealing.


1991 ◽  
Vol 137-138 ◽  
pp. 287-290 ◽  
Author(s):  
A. Hamed ◽  
H. Fritzsche ◽  
X.-M. Deng ◽  
S. Köhler ◽  
R. Gupta

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