Epitaxial crystal growth by sputter deposition: Applications to semiconductors. Part I

1983 ◽  
Vol 11 (1) ◽  
pp. 47-97 ◽  
Author(s):  
Joseph E. Greene
Author(s):  
M. G. Lagally

It has been recognized since the earliest days of crystal growth that kinetic processes of all Kinds control the nature of the growth. As the technology of crystal growth has become ever more refined, with the advent of such atomistic processes as molecular beam epitaxy, chemical vapor deposition, sputter deposition, and plasma enhanced techniques for the creation of “crystals” as little as one or a few atomic layers thick, multilayer structures, and novel materials combinations, the need to understand the mechanisms controlling the growth process is becoming more critical. Unfortunately, available techniques have not lent themselves well to obtaining a truly microscopic picture of such processes. Because of its atomic resolution on the one hand, and the achievable wide field of view on the other (of the order of micrometers) scanning tunneling microscopy (STM) gives us this opportunity. In this talk, we briefly review the types of growth kinetics measurements that can be made using STM. The use of STM for studies of kinetics is one of the more recent applications of what is itself still a very young field.


1994 ◽  
pp. 317-320
Author(s):  
O. Kouchi ◽  
Y. Abe ◽  
Y. Kogure ◽  
Masao Doyama ◽  
M. Matsui

2002 ◽  
Vol 89 (25) ◽  
Author(s):  
J. P. Hoogenboom ◽  
A. Yethiraj ◽  
A. K. van Langen-Suurling ◽  
J. Romijn ◽  
A. van Blaaderen

2018 ◽  
Vol 230 (3) ◽  
pp. 785-838 ◽  
Author(s):  
Marco Caroccia ◽  
Riccardo Cristoferi ◽  
Laurent Dietrich

2001 ◽  
Vol 188 (2) ◽  
pp. 579-582 ◽  
Author(s):  
S. Murata ◽  
M. Ikenaga ◽  
K. Nakamura ◽  
A. Tachibana ◽  
K. Matsumoto

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