To achieve an effective surface-enhanced Raman scattering (SERS) sensor with periodically distributed “hot spots” on wafer-scale substrates, we propose a hybrid approach combining physical nano-imprint lithography and a chemical deposition method to form a silver microbead array. Nano-imprint lithography (NIL) can lead to mass-production and high throughput, but is not appropriate for generating strong “hot-spots.” However, when we apply electrochemical deposition to an NIL substrate and the reaction time was increased to 45 s, periodical “hot-spots” between the microbeads were generated on the substrates. It contributed to increasing the enhancement factor (EF) and lowering the detection limit of the substrates to 4.40 × 106 and 1.0 × 10−11 M, respectively. In addition, this synthetic method exhibited good substrate-to-substrate reproducibility (RSD < 9.4%). Our research suggests a new opportunity for expanding the SERS application.
Correction: Towards improved precision in the quantification of surface-enhanced Raman scattering (SERS) enhancement factors: a renewed approach
