Maskless, fast and highly selective etching of fused silica with gaseous fluorine and gaseous hydrogen fluoride

2013 ◽  
Vol 24 (2) ◽  
pp. 025004 ◽  
Author(s):  
Francesco Venturini ◽  
Rebeca Martinez Vazquez ◽  
Roberto Osellame ◽  
Giulio Cerullo ◽  
Maurizio Sansotera ◽  
...  
Keyword(s):  
Hydrogen Fluoride ◽  
Fused Silica ◽  
Selective Etching ◽  
Gaseous Hydrogen ◽  
Gaseous Fluorine

Polarization-selective etching in femtosecond laser-assisted microfluidic channel fabrication in fused silica

2005 ◽  
Vol 30 (14) ◽  
pp. 1867 ◽  
Author(s):  
C. Hnatovsky ◽  
R. S. Taylor ◽  
E. Simova ◽  
V. R. Bhardwaj ◽  
D. M. Rayner ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Microfluidic Channel ◽  
Fused Silica ◽  
Selective Etching
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