Numerical study of Si nanoparticle formation by SiCl4hydrogenation in RF plasma

2016 ◽  
Vol 25 (2) ◽  
pp. 025011 ◽  
Author(s):  
Christophe Rehmet ◽  
Tengfei Cao ◽  
Yi Cheng
Author(s):  
A K Gilfanov ◽  
W Koch ◽  
S K Zaripov ◽  
O D Rybdylova

NANO ◽  
2009 ◽  
Vol 04 (02) ◽  
pp. 107-117 ◽  
Author(s):  
DAEKWANG WOO ◽  
JAEJUNG SEO ◽  
TAESUNG KIM

This paper presents a numerical model of silicon nanoparticle formation process during silane ( SiH 4) pyrolysis. Aerosol dynamics model, which includes particle growth by surface reaction, coagulation, and transport, was coupled with a chemical kinetics model using CHEMKIN 4.1.1 with particle tracking module (PTM). The general dynamic equation (GDE) was solved by using the method of moment (MOM). The effect of reactor temperature, pressure, total flow rate, and initial silane concentration was successfully investigated under conditions typically used for atmospheric-pressure silane pyrolysis system and we compared the calculated results on particle formation with published experimental data. The simulation results show that particle formation is very sensitive to temperature and initial silane concentration. We observed that numerical simulation results showed a good agreement with experimental data for parameters such as particle concentration, diameter, growth rate, and total volume concentration.


2018 ◽  
Vol 112 (1) ◽  
pp. 013102 ◽  
Author(s):  
C. Pattyn ◽  
E. Kovacevic ◽  
S. Hussain ◽  
A. Dias ◽  
T. Lecas ◽  
...  

2006 ◽  
Vol 10 (2) ◽  
pp. 257-272 ◽  
Author(s):  
J. Z. Wen ◽  
M. J. Thomson ◽  
M. F. Lightstone

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