Optimization and characterization of direct UV laser writing system for microscale applications

2020 ◽  
Vol 30 (9) ◽  
pp. 095003 ◽  
Author(s):  
Sangam Srikanth ◽  
Sohan Dudala ◽  
Sushil Raut ◽  
Satish Kumar Dubey ◽  
Idaku Ishii ◽  
...  
Keyword(s):  
Writing System ◽  
Uv Laser ◽  
Laser Writing

Bonding PDMS Microfluidic Devices to PMMA and Glass Substrate Using Pulsed UV Laser Technology

2014 ◽  
Vol 939 ◽  
pp. 186-193 ◽  
Author(s):  
Chih Chung Yang ◽  
Wen Tse Hsiao ◽  
Chien Kai Chung ◽  
Kuo Cheng Huang
Keyword(s):  
Adhesive Layer ◽  
Polymeric Materials ◽  
Contact Angle Measurement ◽  
Angle Measurement ◽  
Oxygen Plasma Treatment ◽  
Writing System ◽  
Uv Laser ◽  
Laser Writing ◽  
Water Contact ◽  
Sem Image

This study presents a new method for surface modification of polymeric materials by using pulsed UV laser welding technology. The bonding procedures including ablation treatment, Oxygen plasma treatment, adhesive layer bonding and cured by pulsed UV laser writing system was exhibited. The investigation of various parameters for UV laser writing system was performed and discussed by using water contact angle measurement. This technique has been successfully applied to bond dissimilar polymer substrates (polydimethylsiloxane (PDMS) to polymethylmethacrylate (PMMA)). The scanning electron microscopy (SEM) image reveals clearly that there was no clogging in the microchannel or deformation observed between PDMS and PMMA. The method was straightforward and the integrity of microfluidic features was successfully preserved after bonding.

Direct UV laser writing system to photolithographically fabricate optimal microfluidic geometries: Experimental investigations

2020 ◽  
Vol 28 ◽  
pp. 799-803
Author(s):  
Sangam Srikanth ◽  
Jaligam Murali Mohan ◽  
Sohan Dudala ◽  
Satish Kumar Dubey ◽  
Arshad Javed ◽  
...  
Keyword(s):  
Experimental Investigations ◽  
Writing System ◽  
Uv Laser ◽  
Laser Writing

Experimental and theoretical characterization of the Cn=2,16- clusters produced by 337nm UV laser

2007 ◽  
Vol 445 (4-6) ◽  
pp. 147-151 ◽  
Author(s):  
Francisco Alberto Fernandéz-Lima ◽  
Cássia Ribeiro Ponciano ◽  
Enio Frota da Silveira ◽  
Marco Antonio Chaer Nascimento
Keyword(s):  
Uv Laser ◽  
Theoretical Characterization

Evaluation of the Effect of Ultraviolet Light Excitation during Characterization of Silicon Carbide Epitaxial Layers

2018 ◽  
Vol 924 ◽  
pp. 261-264
Author(s):  
Hrishikesh Das ◽  
Swapna Sunkari ◽  
Oener Akdik ◽  
Andrei Konstantinov ◽  
Krister Gumaelius ◽  
...  
Keyword(s):  
Silicon Carbide ◽  
Ultraviolet Light ◽  
Defect Detection ◽  
Uv Light ◽  
Surface Treatments ◽  
Uv Laser ◽  
Original State ◽  
Optimal Surface ◽  
Light Excitation

The scanning of Silicon Carbide (SiC) epitaxy wafers for defects by ultraviolet (UV) laser or lamps is widely prevalent. In this work, we document the effects of UV light excitation on the SiC epitaxy material. An increase in background photoluminescence (PL) is observed after repeated scans. The effect of this increase on defect detection is shown. Optimal surface treatments to recover the material back to the original state are demonstrated. Further, some surface treatments are proposed which reduce the effect of the UV light excitation and prevent to a large extent the rise in background PL.

Parallel laser writing system with scanning Dammann lithography

2014 ◽  
Vol 12 (8) ◽  
pp. 080501-80504 ◽  
Author(s):  
Feng Zhu Feng Zhu ◽  
Jianyong Ma Jianyong Ma ◽  
Wei Huang Wei Huang ◽  
Jin Wang Jin Wang ◽  
Changhe Zhou Changhe Zhou
Keyword(s):  
Writing System ◽  
Laser Writing

Optical characterization of pigments by reflectance spectroscopy in support of UV laser cleaning treatments

2008 ◽  
Vol 92 (1) ◽  
pp. 223-227 ◽  
Author(s):  
S. Acquaviva ◽  
E. D’Anna ◽  
M.L. De Giorgi ◽  
A. Della Patria ◽  
L. Pezzati
Keyword(s):  
Optical Characterization ◽  
Reflectance Spectroscopy ◽  
Laser Cleaning ◽  
Uv Laser
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