Generation and evolution of Vortex array with variable-ratio lateral-shearing interferometry

2022 ◽  
Author(s):  
yong li ◽  
Junyong Zhang ◽  
jianlang li

Abstract Different from the method by plane-wave interference, here an efficient approach is proposed to generate optical vortex array (VA) based on lateral-shearing interferometer (LSI), in which the evolution from light spot array to VA can be observed by continuously variable shear ratio in a certain range. VAs with topological charge 2 and 1 are simulated by software GLAD and proved to be effectiveness through optical experiment. Theoretical analysis and experimental results show that when the shear ratio approaches to zero, we can stably obtain a vortex array with high density and variable topological charge.

2014 ◽  
Vol 568-570 ◽  
pp. 50-54 ◽  
Author(s):  
Juan Ren ◽  
Xiu Juan Luo ◽  
Ai Li Xia ◽  
Yu Zhang

Quadri-wave lateral shearing interferometry (QWLSI) is a new and powerful technique for wave-front measurement. This paper deduced the principle of QWLSI in details, showed a Fourier analysis of the resulting interferogram, then obtained a wave-front with high accuracy and minimum reconstruction error by using the least square method. Finally a 532nm laser was measured to validate the reconstruction, and the error analysis was discussed in practical laser metrology. It is concluded that QWLSI provides a better choice for the adaptive optics as compared with traditional lateral shearing interferometer (TLSI) and Shack-Hartmann (S-H) wave-front sensor.


2004 ◽  
Author(s):  
Yucong Zhu ◽  
Katsumi Sugisaki ◽  
Chidane Ouchi ◽  
Masanobu Hasegawa ◽  
Masahito Niibe ◽  
...  

2013 ◽  
Vol 718-720 ◽  
pp. 848-852
Author(s):  
Jun Hong Su ◽  
Ying Shi ◽  
Jin Man Ge

The film thickness is an important technical indicator of film devices, and its accuracy directly affects various performances of optical components. In fabrication process of film device, fast and accurate measurement of film thickness has positive significance on product quality control. In this paper, measure film thickness with lateral shearing interferometry. Collect interferograms through structured lateral shearing interference platform, process interferogram with Fast Fourier Transform method to extract phase, unwrap the wrapped phase to achieve phase value. Finally, calculate film thickness based on lateral shearing interference principle. The thickness of sample is 119.6800nm measured by this method, basically the same with the result 120.6036nm that measured by ZYGO interferometer. This experiment shows that lateral shearing interferometry not only suit to measurement of film thickness, but also abundant high-precision method of measuring film thickness, and has high practical value.


2019 ◽  
Vol 433 ◽  
pp. 183-189
Author(s):  
Lingqiang Meng ◽  
Yiming Liu ◽  
Zhigang Han ◽  
Hua Shen ◽  
Lei Chen ◽  
...  

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