Epitaxial Growth and Optical Properties of Laser Deposited CdS Thin Films

In this study, cadmium Sulfide (CdS) thin films were synthesized on quartz substrates using an infrared pulsed laser deposition (IR-PLD) technique under high vacuum (~10−6 Torr) conditions. X-ray diffraction was used to evaluate the structural features. According to X-ray analysis, the deposited CdS films are crystalline and have a favored orientation on a plane (110) of an orthorhombic. The peak intensity and the average crystallite size increases with increasing the film thickness. After annealing at 300 °C, the orthorhombic phase transformed into a predominant hexagonal phase and the same result was obtained by SEM photographs as well. Spectrophotometric measurements of transmittance and reflectance of the CdS films were used to derive optical constants (n, k, and absorption coefficient α). The optical band gap energy was found to be 2.44 eV. The plasma plume formation and expansion during the film deposition have also been discussed. The photocurrent response as a function of the incident photon energy E (eV) at different bias voltages for different samples of thicknesses (85, 180, 220 and 340 nm) have been studied, indicating that the photocurrent increases by increasing both the film thickness and photon energy with a peak in the vicinity of the band edge. Thus, the prepared CdS films are promising for application in optoelectronic field.

Effects of film thickness and alkaline concentration on dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution

The dissolution behavior of a simple combination of poly(4-hydroxystyrene) (PHS) films and tetramethylammonium hydroxide (TMAH) aqueous solution was analyzed to gain a fundamental understanding of the effects of film thickness and alkaline concentration on the dissolution kinetics of chemically amplified resists (CARs). Films of four different thicknesses, from thick (approximately 900 nm) to thin (approximately 50 nm), were developed in 22 different developers of different concentrations. The dissolution behavior of each combination was observed using a quartz crystal microbalance (QCM). Differences in dissolution kinetics due to film thickness were observed even between relatively thick films such as 900- and 500-nm thick films in dilute developers. These differences were considered to be caused by the diffusion of the solution into the films. Thin films also showed characteristic behavior with dilution. This behavior was due to the interaction between the substrate and the films, unlike in the case of thick films.

In situ monitoring of the electrical property of carbon nanotube thin film in floating catalyst chemical vapor deposition

In floating catalyst chemical vapor deposition (FCCVD), when a carbon nanotube (CNT) network film is produced by filter collection, the film thickness is adjusted by controlling the collection time. However, even with consistent synthesis parameters, the synthesis condition in FCCVD changes constantly depending on the carbon and catalyst adhesion to the inner wall of the reaction tube. Thus, the rate of synthesis changes, making it difficult to obtain the target film thickness repeatedly and stably. We propose a method of monitoring CNT film thickness and percolation threshold by the in situ measurement of the electrical impedance during the deposition. The time evolution of the measured impedance is reproducible by an equivalent electrical circuit simulation.

Analysis of Uniform Film Thickness and Stationarypoints for the Thin Film Flow of Carreau Fluid Model in the Presence of Surface Tension Gradient

This article addresses the analysis of the uniform film thickness and stationary points forthe Carreau thin fluid film flow. The flow of fluid on a vertically upward moving cylinder takesplace in the presence of a surface tension gradient. The resulting non-linear and inhomogeneousordinary differential equation is solved for the series form solution using Adomian decompositionmethods (ADM). Stokes number St, inverse capillary number C, Weissenberg number W e andfluid behavior index n emerged as flow control parameters. The analysis showed that thepositions of stationary points transferred towards the surface of the cylinder by the increase ofSt and C while towards the fluid-air interface by the increase of n. W e delineated vice versaeffects on positions of stationary points for the shear thickening fluid film and shear thinningfluid film. The width of uniform film thickness reduces by an increment in the St and Cwhereas it increases by an increment in the n. The width of shear thickening uniform filmthickness increases whilst shear thinning uniform film thickness decreases as the W e increases. A comparison between the linearly viscous fluid and Carreau fluid is also made.

Numerical and Parametric Analysis for Enhancing Performances of Water Photovoltaic/Thermal System

Photovoltaic/thermal (PV/T) systems are innovative cogeneration systems that ensure the cooling of photovoltaic (PV) backside and simultaneous production of electricity and heat. However, an effective cooling of the PV back is still a challenge that affects electrical and thermal performance of the PV/T system. In the present work, a PV/T numerical model is developed to simulate the heat flux based on energy balance implemented in MATLAB software. The numerical model is validated through the comparison of the three-layer PV model with the NOCT model and tested under the operation conditions of continental temperate climate. Moreover, the effect of velocity and water film thickness as important flow parameters on heat exchange and PV/T production is numerically investigated. Results revealed that the PV model is in good agreement with the NOCT one. An efficient heat transfer is obtained while increasing the velocity and water film thickness with optimal values of 0.035 m/s and 7 mm, respectively, at an inlet temperature of 20 °C. The PV/T system ensures a maximum thermal power of 1334.5 W and electrical power of 316.56 W (258.8 W for the PV). Finally, the comparison between the PV and PV/T system under real weather conditions showed the advantage of using the PV/T.

Elucidation of contact state on various rough surfaces via highly robust colorimetric optical interferometry

In this study, we developed and practiced colorimetric optical interferometry for the direct observation of contact states to clarify contact phenomena. We theoretically demonstrated that the effect of roughness diffuse reflection could be neglected using interferometric light intensity according to the relationship between the optical film thickness and hue. Then, we measured the static contact surfaces of spherical test pieces of different root mean square roughnesses. Results indicate that the nominal contact area is significantly larger than that obtained from the Hertzian theory of smooth contact as the surface roughness increases. The contact film thickness on the nominal contact area increases almost in proportion to the root mean square roughness. Our experiment supports the validity of the contact theory and contact simulation with very small roughnesses, which have been difficult to verify experimentally. The advantage of this measurement is that it can simultaneously capture the macroscopic contact area and microscopic film thickness distribution, which is expected to further expand the range of application.