Twist-induced preferential distribution of dopants in single-crystalline Si nanowires

2019 ◽  
Vol 100 (17) ◽  
Author(s):  
Xing-Ju Zhao ◽  
Gotthard Seifert ◽  
Junyi Zhu ◽  
Dong-Bo Zhang
2019 ◽  
Vol 6 (3) ◽  
pp. 532-539 ◽  
Author(s):  
Dong-Bo Zhang ◽  
Xing-Ju Zhao ◽  
Gotthard Seifert ◽  
Kinfai Tse ◽  
Junyi Zhu

The distribution of dopants significantly influences the properties of semiconductors, yet effective modulation and separation of p-type and n-type dopants in homogeneous materials remain challenging, especially for nanostructures. Employing a bond orbital model with supportive atomistic simulations, we show that axial twisting can substantially modulate the radial distribution of dopants in Si nanowires (NWs) such that dopants of smaller sizes than the host atom prefer atomic sites near the NW core, while dopants of larger sizes are prone to staying adjacent to the NW surface. We attribute such distinct behaviors to the twist-induced inhomogeneous shear strain in NW. With this, our investigation on codoping pairs further reveals that with proper choices of codoping pairs, e.g. B and Sb, n-type and p-type dopants can be well separated along the NW radial dimension. Our findings suggest that twisting may lead to realizations of p–n junction configuration and modulation doping in single-crystalline NWs.


Nano Letters ◽  
2017 ◽  
Vol 17 (12) ◽  
pp. 7323-7329 ◽  
Author(s):  
Bing-Chang Zhang ◽  
Hui Wang ◽  
Le He ◽  
Cai-Jun Zheng ◽  
Jian-Sheng Jie ◽  
...  

2011 ◽  
Vol 21 (3) ◽  
pp. 801-805 ◽  
Author(s):  
Huihui Chen ◽  
Rujia Zou ◽  
Haihua Chen ◽  
Na Wang ◽  
Yangang Sun ◽  
...  

2006 ◽  
Vol 60 (17-18) ◽  
pp. 2125-2128 ◽  
Author(s):  
J.B. Chang ◽  
J.Z. Liu ◽  
P.X. Yan ◽  
L.F. Bai ◽  
Z.J. Yan ◽  
...  

2011 ◽  
Vol 23 (1) ◽  
pp. 015307 ◽  
Author(s):  
Tao Wang ◽  
Bin Yu ◽  
Yan Liu ◽  
Qing Guo ◽  
Kuang Sheng ◽  
...  

2010 ◽  
Vol 5 (2) ◽  
pp. 139-142 ◽  
Author(s):  
Sungho Woo ◽  
Seungsoo Lee ◽  
Yoon Soo Han ◽  
Hongkun Lyu ◽  
Kangpil Kim ◽  
...  

2005 ◽  
Vol 6 (5) ◽  
pp. 198-201
Author(s):  
Kyung-Hwan Kim ◽  
Ki-Hyun Keem ◽  
Jeong-Min Kang ◽  
Chang-Joon Yoon ◽  
Dong-Young Jeong ◽  
...  

2016 ◽  
Vol 2 (8) ◽  
pp. e1501382 ◽  
Author(s):  
Hongti Zhang ◽  
Jerry Tersoff ◽  
Shang Xu ◽  
Huixin Chen ◽  
Qiaobao Zhang ◽  
...  

Achieving high elasticity for silicon (Si) nanowires, one of the most important and versatile building blocks in nanoelectronics, would enable their application in flexible electronics and bio-nano interfaces. We show that vapor-liquid-solid–grown single-crystalline Si nanowires with diameters of ~100 nm can be repeatedly stretched above 10% elastic strain at room temperature, approaching the theoretical elastic limit of silicon (17 to 20%). A few samples even reached ~16% tensile strain, with estimated fracture stress up to ~20 GPa. The deformations were fully reversible and hysteresis-free under loading-unloading tests with varied strain rates, and the failures still occurred in brittle fracture, with no visible sign of plasticity. The ability to achieve this “deep ultra-strength” for Si nanowires can be attributed mainly to their pristine, defect-scarce, nanosized single-crystalline structure and atomically smooth surfaces. This result indicates that semiconductor nanowires could have ultra-large elasticity with tunable band structures for promising “elastic strain engineering” applications.


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