Picosecond Photoinduced Absorption as a Probe of Metastable Light-Induced Defects in Intrinsic Hydrogenated Amorphous Silicon

1988 ◽  
Vol 60 (2) ◽  
pp. 148-151 ◽  
Author(s):  
Terry L. Gustafson ◽  
Harvey Scher ◽  
Dale M. Roberts ◽  
Robert W. Collins
1991 ◽  
pp. 265-268
Author(s):  
H. Labidi ◽  
K. Zellama ◽  
P. Germain ◽  
M. Astier ◽  
D. Lortigues ◽  
...  

2006 ◽  
Vol 100 (3) ◽  
pp. 033104 ◽  
Author(s):  
Francesco Giuseppe Della Corte ◽  
Massimo Gagliardi ◽  
Maria Arcangela Nigro ◽  
Caterina Summonte

1992 ◽  
Vol 258 ◽  
Author(s):  
Masao Isomura ◽  
Sigurd Wagner

ABSTRACTWe report a study of the rates of generation and of annealing of the light-induced defects in hydrogenated amorphous silicon (a-Si:H). The rates of generation are found to be sensitive to temperature when the light intensity is high. This increased sensitivity to temperature at high rates suggests that a temperature-activated process such as hydrogen motion controls the rates of generation more when they are high. The rate of annealing at 130°C is strongly accelerated by illumination, and depends strongly on the light intensity. This may be explained by the diffusion of hydrogen, accelerated by excess carriers.


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