Optimization and simulation of exposure pattern for scanning laser lithography

2015 ◽  
Author(s):  
Omid T. Ghalehbeygi ◽  
Garth Berriman ◽  
Andrew J. Fleming ◽  
John L. Holdsworth
Keyword(s):  
Scanning Laser ◽  
Laser Lithography ◽  
Optimization And Simulation ◽  
Exposure Pattern

Exposure Optimization in Scanning Laser Lithography

2016 ◽  
Vol 35 (4) ◽  
pp. 33-39
Author(s):  
Andrew J. Fleming ◽  
Adrian G. Wills ◽  
Ben S. Routley
Keyword(s):  
Scanning Laser ◽  
Laser Lithography

Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography

2018 ◽  
Author(s):  
Omid T. Ghalehbeygi ◽  
John O'Connor ◽  
Ben S. Routley ◽  
Andrew J. Fleming
Keyword(s):  
Scanning Laser ◽  
Laser Lithography ◽  
Iterative Deconvolution

A nonlinear programming approach to exposure optimization in scanning laser lithography

2016 ◽  
Author(s):  
Andrew J. Fleming ◽  
Adrian Wills ◽  
Omid T. Ghalehbeygi ◽  
Ben Routley ◽  
Brett Ninness
Keyword(s):  
Nonlinear Programming ◽  
Scanning Laser ◽  
Programming Approach ◽  
Laser Lithography

scholarly journals Experimental Scanning Laser Lithography with Exposure Optimization

2017 ◽  
Vol 50 (1) ◽  
pp. 8662-8667 ◽  
Author(s):  
Andrew J. Fleming ◽  
Omid T. Ghalehbeygi ◽  
Ben S. Routley ◽  
Adrian G. Wills
Keyword(s):  
Scanning Laser ◽  
Laser Lithography

Scanning Laser Lithography With Constrained Quadratic Exposure Optimization

2019 ◽  
Vol 27 (5) ◽  
pp. 2221-2228
Author(s):  
Andrew J. Fleming ◽  
Omid T. Ghalehbeygi ◽  
Ben S. Routley ◽  
Adrian G. Wills
Keyword(s):  
Scanning Laser ◽  
Laser Lithography

Fading of the diaminobenzidine reaction product in the confocal scanning laser microscope

1989 ◽  
Vol 47 ◽  
pp. 146-147
Author(s):  
JS Deitch ◽  
KL Smith ◽  
JW Swann ◽  
JN Turner
Keyword(s):  
Pyramidal Neurons ◽  
Light And Electron Microscopy ◽  
Scanning Laser ◽  
Laser Exposure ◽  
Confocal Scanning Laser Microscope ◽  
Fluorescent Markers ◽  
Before And After ◽  
Staining Protocol ◽  
Confocal Scanning ◽  
Confocal Scanning Laser

Neurons labeled with horseradish peroxidase and reacted with diaminobenzidine (DAB) can be imaged using a confocal scanning laser microscope (CSLM) in the reflection mode. In contrast to fluorescent markers, the DAB reaction product is thought to be stable and can be observed by both light and electron microscopy. We have investigated the sensitivity of the DAB reaction product to laser irradiation, and present the spectrophotometric properties of DAB before and after exposure in the CSLM.Pyramidal neurons in slices of rat hippocampus were injected with biocytin (a biotin-lysine complex), fixed overnight in 4% paraformaldehyde, and vibratome sectioned at 75 μm. Biocytin was detected with avidin-HRP (1:200) in 0.5% Triton X-100, incubated in DAB (0.5 mg/ml) with or without 0.04% nickel ammonium sulfate (Ni), dehydrated, and imaged in a Bio Rad MRC-500 CSLM with an argon ion laser (488 and 514 nm). Spectrophotometric measurements of the soma were made on a Zeiss microspectrophotometer, as a function of laser exposure (100-1000 scans) and staining protocol.

Green Tea Extract Exposure Pattern Differenzially Affects Acetaminophen-Induced Hepatotoxicity

Planta Medica ◽  
2011 ◽  
Vol 77 (05) ◽  
Author(s):  
A Ali ◽  
X Yang ◽  
Q Shi ◽  
J Greenhaw ◽  
WF Salminen
Keyword(s):  
Green Tea ◽  
Green Tea Extract ◽  
Exposure Pattern ◽  
Tea Extract
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