Polymer screening method for chemically amplified electron beam and X-ray resists

2004 ◽  
Author(s):  
H. Yamamoto ◽  
A. Nakano ◽  
K. Okamoto ◽  
T. Kozawa ◽  
S. Tagawa
Keyword(s):  
Electron Beam ◽  
Screening Method ◽  
X Ray ◽  
Chemically Amplified

Polymer Screening Method for Chemically Amplified Electron Beam and X-Ray Resists

2004 ◽  
Vol 43 (6B) ◽  
pp. 3971-3973 ◽  
Author(s):  
Hiroki Yamamoto ◽  
Atsuro Nakano ◽  
Kazumasa Okamoto ◽  
Takahiro Kozawa ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
Screening Method ◽  
X Ray ◽  
Chemically Amplified

Single-component chemically amplified resist materials for electron-beam and x-ray lithography

1991 ◽  
Author(s):  
Anthony E. Novembre ◽  
Woon W. Tai ◽  
Janet M. Kometani ◽  
James E. Hanson ◽  
Omkaram Nalamasu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Single Component ◽  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Radiation-Induced Acid Generation Reactions in Chemically Amplified Resists for Electron Beam and X-Ray Lithography

1992 ◽  
Vol 31 (Part 1, No. 12B) ◽  
pp. 4301-4306 ◽  
Author(s):  
Takahiro Kozawa ◽  
Yoichi Yoshida ◽  
Mitsuru Uesaka ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
X Ray ◽  
Acid Generation ◽  
Chemically Amplified ◽  
Radiation Induced ◽  
Chemically Amplified Resists

Study of Radiation-Induced Reactions in Chemically Amplified Resists for Electron Beam and X-Ray Lithography

1992 ◽  
Vol 31 (Part 2, No. 11A) ◽  
pp. L1574-L1576 ◽  
Author(s):  
Takahiro Kozawa ◽  
Yoichi Yoshida ◽  
Mitsuru Uesaka ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
X Ray ◽  
Chemically Amplified ◽  
Radiation Induced ◽  
Chemically Amplified Resists

Effects of Impurities on Processes of Acid Generation in Chemically Amplified Resists for Electron Beam and X-Ray Lithography

1993 ◽  
Vol 32 (Part 1, No. 12B) ◽  
pp. 6049-6051 ◽  
Author(s):  
Takahiro Kozawa ◽  
Mitsuru Uesaka ◽  
Yoichi Yoshida ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
X Ray ◽  
Acid Generation ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Aspects of microanalysis in a transmission electron microscope

1978 ◽  
Vol 36 (1) ◽  
pp. 510-511
Author(s):  
R. Sinclair ◽  
B.E. Jacobson
Keyword(s):  
Grain Size ◽  
Electron Beam ◽  
Electron Microscope ◽  
Chemical Analysis ◽  
Transmission Electron Microscope ◽  
Vapor Deposition ◽  
Critical Currents ◽  
X Ray ◽  
Fine Grain ◽  
Transmission Electron

INTRODUCTIONThe prospect of performing chemical analysis of thin specimens at any desired level of resolution is particularly appealing to the materials scientist. Commercial TEM-based systems are now available which virtually provide this capability. The purpose of this contribution is to illustrate its application to problems which would have been intractable until recently, pointing out some current limitations.X-RAY ANALYSISIn an attempt to fabricate superconducting materials with high critical currents and temperature, thin Nb3Sn films have been prepared by electron beam vapor deposition [1]. Fine-grain size material is desirable which may be achieved by codeposition with small amounts of Al2O3 . Figure 1 shows the STEM microstructure, with large (∽ 200 Å dia) voids present at the grain boundaries. Higher quality TEM micrographs (e.g. fig. 2) reveal the presence of small voids within the grains which are absent in pure Nb3Sn prepared under identical conditions. The X-ray spectrum from large (∽ lμ dia) or small (∽100 Ǻ dia) areas within the grains indicates only small amounts of A1 (fig.3).

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