Wave Equation-Based Semivectorial Compact 2-D-FDTD Method for Optical Waveguide Modal Analysis

2004 ◽  
Vol 22 (2) ◽  
pp. 677-683 ◽  
Author(s):  
G.-R. Zhou ◽  
X. Li
Keyword(s):  
Wave Equation ◽  
Modal Analysis ◽  
Optical Waveguide ◽  
Fdtd Method

An unconditionally stable FDTD method based on wave equation

2008 ◽  
Vol 51 (2) ◽  
pp. 529-532 ◽  
Author(s):  
Hai Lin ◽  
Gaofeng Wang ◽  
Feng Liang
Keyword(s):  
Wave Equation ◽  
Fdtd Method ◽  
Unconditionally Stable

Modal Analysis of a Doubly Clad Optical Waveguide Having a Cross-section of the Shape of a Lemniscate

2009 ◽  
Vol 30 (9) ◽  
pp. 1012-1019 ◽  
Author(s):  
R. Janma ◽  
R. Jatan ◽  
S. P. Singh ◽  
P. Dwivedi ◽  
V. Dwivedi ◽  
...  
Keyword(s):  
Modal Analysis ◽  
Optical Waveguide ◽  
Cross Section

Design and Fabrication of a SOI Optical Waveguide Sensing Platform for Biochemical Sensor Application

2015 ◽  
Vol 645-646 ◽  
pp. 777-782
Author(s):  
Yu Jin Liu ◽  
Ying Dong ◽  
Deng Peng Yuan ◽  
Tian Jian Li
Keyword(s):  
Optical Waveguide ◽  
Inductively Coupled Plasma ◽  
Fdtd Method ◽  
Strong Support ◽  
Single Mode ◽  
Transmission Condition ◽  
Single Mode Fiber ◽  
Biochemical Sensor ◽  
Icp Etching ◽  
Sensing Platform

A micro biochemical sensor based on a SOI optical waveguide sensing platform is reported in this article. The sensing platform utilizes a Mach-Zehnder Interferometer (MZI) configuration. In order to satisfy the single-mode transmission condition of the waveguide and match the coupling size of standard single-mode fiber, a ridge waveguide structure is adopted to construct the MZI configuration. The key parameters of the waveguide are optimized by FDTD method. A process composed of contact exposure photolithography and Inductively Coupled Plasma (ICP) etching technology has been worked out for the fabrication of the optical waveguide sensing platform on SOI wafer. In the process, only one photolithographic mask is used. The mask is designed to have several patterns including an array of MZI configurations for multiple species sensing, a group of ridge waveguides with different key parameters as test references, and a group of geometric compensation schemes to test the methods of modifying the deviation which may arise during the ICP etching step. Process simulations are conducted to predict the exposure and etching results, which give strong support to the fabrication process control. Lithography problems including photoresist desquamation and line narrowing are solved to achieve the special structure.

Multi-domain spectral method for modal analysis of optical waveguide

2009 ◽  
Vol 41 (8) ◽  
pp. 583-597 ◽  
Author(s):  
Fahhad Alharbi ◽  
J. Campbell Scott
Keyword(s):  
Modal Analysis ◽  
Spectral Method ◽  
Optical Waveguide
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