Lead chalcogenide films grown by pulsed laser deposition

2017 ◽  
Author(s):  
I.S. Virt ◽  
Y. Tur ◽  
E. Lusakowska ◽  
G. Luka ◽  
P. Potera ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Lead Chalcogenide ◽  
Chalcogenide Films

scholarly journals Growth Mechanisms and Structural Properties of Lead Chalcogenide Films Grown by Pulsed Laser Deposition

2016 ◽  
Vol 46 (1) ◽  
pp. 175-181 ◽  
Author(s):  
I. S. Virt ◽  
I. O. Rudyi ◽  
I. Ye. Lopatynskyi ◽  
Yu. Dubov ◽  
Y. Tur ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Structural Properties ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Growth Mechanisms ◽  
Lead Chalcogenide ◽  
Chalcogenide Films

Thickness distribution of thin amorphous chalcogenide films prepared by pulsed laser deposition

2008 ◽  
Vol 93 (3) ◽  
pp. 617-620 ◽  
Author(s):  
Martin Pavlišta ◽  
Martin Hrdlička ◽  
Petr Němec ◽  
Jan Přikryl ◽  
Miloslav Frumar
Keyword(s):  
Pulsed Laser Deposition ◽  
Thickness Distribution ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Chalcogenide Films ◽  
Amorphous Chalcogenide

AgAsS2 amorphous chalcogenide films prepared by pulsed laser deposition

2004 ◽  
Vol 79 (4-6) ◽  
pp. 1563-1565 ◽  
Author(s):  
T. Wagner ◽  
M. Krbal ◽  
P. Nemec ◽  
M. Frumar ◽  
Th. Wagner ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Chalcogenide Films ◽  
Amorphous Chalcogenide

Dysprosium-doped chalcogenide films prepared by pulsed-laser deposition

2004 ◽  
Author(s):  
Virginie Nazabal ◽  
Petr Nemec ◽  
Jaroslav Jedelsk² ◽  
Claire Duverger ◽  
Jenny Le Person ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Chalcogenide Films

Thin amorphous chalcogenide films prepared by pulsed laser deposition

2002 ◽  
Vol 299-302 ◽  
pp. 1013-1017 ◽  
Author(s):  
P. Němec ◽  
M. Frumar ◽  
J. Jedelský ◽  
M. Jelı́nek ◽  
J. Lančok ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Chalcogenide Films ◽  
Amorphous Chalcogenide

Pulsed laser deposition of pure and praseodymium-doped Ge–Ga–Se amorphous chalcogenide films

2000 ◽  
Vol 15 (3) ◽  
pp. 191-197 ◽  
Author(s):  
P Němec ◽  
M Frumar ◽  
B Frumarová ◽  
M Jelı́nek ◽  
J Lančok ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Chalcogenide Films ◽  
Amorphous Chalcogenide

Dysprosium doped amorphous chalcogenide films prepared by pulsed laser deposition

2006 ◽  
Vol 29 (2-3) ◽  
pp. 273-278 ◽  
Author(s):  
V. Nazabal ◽  
P. Němec ◽  
J. Jedelský ◽  
C. Duverger ◽  
J. Le Person ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Chalcogenide Films ◽  
Amorphous Chalcogenide

Microanalysis of silicate glass films grown on α-Al2O3 by pulsed-laser deposition

1993 ◽  
Vol 51 ◽  
pp. 438-439
Author(s):  
Michael P. Mallamaci ◽  
James Bentley ◽  
C. Barry Carter
Keyword(s):  
Liquid Phase ◽  
Single Crystal ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Ceramic Materials ◽  
Laser Deposition ◽  
Triple Junctions ◽  
Ion Milling ◽  
Multicomponent Oxides ◽  
Glass Films

Glass-oxide interfaces play important roles in developing the properties of liquid-phase sintered ceramics and glass-ceramic materials. Deposition of glasses in thin-film form on oxide substrates is a potential way to determine the properties of such interfaces directly. Pulsed-laser deposition (PLD) has been successful in growing stoichiometric thin films of multicomponent oxides. Since traditional glasses are multicomponent oxides, there is the potential for PLD to provide a unique method for growing amorphous coatings on ceramics with precise control of the glass composition. Deposition of an anorthite-based (CaAl2Si2O8) glass on single-crystal α-Al2O3 was chosen as a model system to explore the feasibility of PLD for growing glass layers, since anorthite-based glass films are commonly found in the grain boundaries and triple junctions of liquid-phase sintered α-Al2O3 ceramics.Single-crystal (0001) α-Al2O3 substrates in pre-thinned form were used for film depositions. Prethinned substrates were prepared by polishing the side intended for deposition, then dimpling and polishing the opposite side, and finally ion-milling to perforation.

Sign in / Sign up

Export Citation Format

Share Document