Thickness distribution of thin amorphous chalcogenide films prepared by pulsed laser deposition

Lateral compositionally-graded thin films are powerful media for the observation of phase boundaries as well as for high-throughput materials exploration. We herein propose a method to prepare epitaxial lateral compositionally-graded films using a dual-beam pulsed laser deposition (PLD) method with two targets separated by a partition. Tuning the ambient pressure and the partition—substrate gap makes it possible to control of the gradient length of the deposits at the small sizes (≤ 10 mm) suitable for commercial oxide single crystal substrates. A simple Monte Carlo simulation qualitatively reproduced the characteristic features of the lateral thickness distribution. To demonstrate this method, we prepared (1−x)PbTiO3—xPbZrO3 and (1−x)LaMnO3—xLa0.6Sr0.4MnO3 films with lateral composition gradient widths of 10 and 1 mm, respectively, with the partitioned dual PLD.

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Lead chalcogenide films grown by pulsed laser deposition

2017 IEEE 7th International Conference Nanomaterials: Application & Properties (NAP) ◽

10.1109/nap.2017.8190232 ◽

2017 ◽

Author(s):

I.S. Virt ◽

Y. Tur ◽

E. Lusakowska ◽

G. Luka ◽

P. Potera ◽

...

Keyword(s):

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

Lead Chalcogenide ◽

Chalcogenide Films

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Towards Scalable Large-Area Pulsed Laser Deposition

Materials ◽

10.3390/ma14174854 ◽

2021 ◽

Vol 14 (17) ◽

pp. 4854

Author(s):

Zakhar Vakulov ◽

Daniil Khakhulin ◽

Evgeny Zamburg ◽

Alexander Mikhaylichenko ◽

Vladimir A. Smirnov ◽

...

Keyword(s):

Film Thickness ◽

Pulsed Laser Deposition ◽

Thickness Distribution ◽

Large Diameter ◽

Pulsed Laser ◽

Laser Deposition ◽

Uniform Thickness ◽

Technological Parameters ◽

Distribution Profile ◽

Thickness Uniformity

One of the significant limitations of the pulsed laser deposition method in the mass-production-technologies of micro- and nanoelectronic and molecular device electronic fabrication is the issue of ensuring deposition of films with uniform thickness on substrates with large diameter (more than 100 mm) since the area of the laser spot (1–5 mm2) on the surface of the ablated target is incommensurably smaller than the substrate area. This paper reports the methodology that allows to calculate the distribution profile of the film thickness over the surface substrate with a large diameter, taking into account the construction and technological parameters of the pulsed laser deposition equipment. Experimental verification of the proposed methodology showed that the discrepancy with the experiment does not exceed 8%. The modeling of various technological parameters influence on the thickness uniformity has been carried out. Based on the modeling results, recommendations and parameters are proposed for manufacturing uniform thickness films. The results allow for increasing the film thickness uniformity with the thickness distribution < 5% accounts for ~ 31% of 300 mm diameter substrate.

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