Optical emission spectroscopy characterization of a hydrogen diluted silane plasma for microcrystalline silicon thin film deposition

2009 ◽  
Author(s):  
C. H. Chang ◽  
C. C. Du ◽  
K. C. Chen ◽  
J. R. Huang ◽  
Y. L. Chang ◽  
...  
Keyword(s):  
Thin Film ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Microcrystalline Silicon ◽  
Silicon Thin Film ◽  
Silane Plasma

OES, LIF, and MS Studies of Silane, Disilane, and Chlorosilane Plasmas

1986 ◽  
Vol 68 ◽  
Author(s):  
H. U. Lee ◽  
R. C. Ross ◽  
J. P. De Neufville
Keyword(s):  
Power Flow ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
List Type ◽  
Rf Power ◽  
Partial Pressures ◽  
Polymeric Species

AbstractUsing optical emission spectroscopy (OES), mass spectrometry (MS), and laser-induced fluorescence (LIF), we are investigating a number of glow-discharge reactions as a function of RF power, flow rates, partial pressures, and H2 dilution under realistic thin-film deposition conditions.In this paper we report on the preliminary results of two studies: 1)The formation of radical and polymeric species in SiH4 and Si2H6 plasmas, and2)The characterization of SiF4 + H2 plasmas and the detection of HSiCl and HSiF in the plasmas of SiH2Cl2 and SiH2F2, respectively.

Sign in / Sign up

Export Citation Format

Share Document