Langmuir probe and optical emission spectroscopy studies for RF magnetron sputtering during TiON thin film deposition

2020 ◽  
Vol 68 ◽  
pp. 168-177
Author(s):  
A.E. Metawa ◽  
F.M. El-Hossary ◽  
M. Raaif ◽  
M. SalahEl-Deen ◽  
A.A. Abd El-Moula
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Langmuir Probe ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Rf Magnetron Sputtering ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Spectroscopy Studies

Correlation Between In Situ Optical Emission Spectroscopy in a Reactive O2 / AR RF Magnetron Sputtering Discharge and PZT Thin Film Composition

1997 ◽  
Vol 493 ◽  
Author(s):  
F. Ayguavives ◽  
P. Aubert ◽  
B. Ea-Kim ◽  
B. Agius
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Rf Magnetron Sputtering ◽  
Nuclear Reaction Analysis ◽  
Nominal Composition ◽  
Film Composition

ABSTRACTLead zirconate titanate (PZT) thin films have been grown by rf magnetron sputtering on Si substrates from a metallic target of nominal composition Pb1.1(Zr0.4 Ti0.6 in a reactive argon / oxygen gas mixture. During plasma deposition, in situ Optical Emission Spectroscopy (OES) measurements show clearly a correlation between the evolution of characteristic atomic emission line intensities (Zr - 386.4 nm, Ti - 399.9 nm, Pb - 405.8 nm and O - 777.2 nm) and the thin-film composition determined by a simultaneous use of Rutherford Backscattering Spectroscopy (RBS) and Nuclear Reaction Analysis (NRA).

Langmuir Probe and Optical Emission Spectroscopy Studies of Low-Pressure Gas Mixture of CO2and N2

2010 ◽  
Vol 12 (3) ◽  
pp. 314-319 ◽  
Author(s):  
E. F Mendez-Martinez ◽  
P. G Reyes ◽  
D Osorio-Gonzalez ◽  
F Castillo ◽  
H Martinez
Keyword(s):  
Langmuir Probe ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Low Pressure ◽  
Gas Mixture ◽  
Spectroscopy Studies
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