High-brightness negative ion beams from a plasma source and merits for new applications in materials science and microelectronics

IEEE Conference Record - Abstracts. PPPS-2001 Pulsed Power Plasma Science 2001. 28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference (Cat. No.01CH37255) ◽

10.1109/ppps.2001.961386 ◽

2002 ◽

Author(s):

S.K. Guharay

Keyword(s):

Materials Science ◽

Plasma Source ◽

Ion Beams ◽

Negative Ion ◽

High Brightness ◽

New Applications

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Characteristics of focused beam spots using negative ion beams from a compact surface plasma source and merits for new applications

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590461 ◽

1998 ◽

Vol 16 (6) ◽

pp. 3370 ◽

Author(s):

S. K. Guharay

Keyword(s):

Plasma Source ◽

Ion Beams ◽

Compact Surface ◽

Negative Ion ◽

Surface Plasma ◽

New Applications ◽

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Transport of High Brightness Negative Ion Beams

Springer Series on Atomic, Optical, and Plasma Physics - Development and Applications of Negative Ion Sources ◽

10.1007/978-3-030-28437-4_6 ◽

2019 ◽

pp. 295-307

Author(s):

Vadim Dudnikov

Keyword(s):

Ion Beams ◽

Negative Ion ◽

High Brightness

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Negative ion beams from compact surface plasma sources and their merits for new applications

10.1063/1.56366 ◽

1998 ◽

Author(s):

S. K. Guharay

Keyword(s):

Ion Beams ◽

Compact Surface ◽

Negative Ion ◽

Surface Plasma ◽

Plasma Sources ◽

New Applications

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Applications of Ion Beams to Materials Science

Interaction of Charged Particles with Solids and Surfaces - Nato ASI Series ◽

10.1007/978-1-4684-8026-9_9 ◽

1991 ◽

pp. 309-311

Author(s):

L. C. Feldman

Keyword(s):

Materials Science ◽

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Cavity ring-down spectroscopy to measure negative ion density in a helicon plasma source for fusion neutral beams

Review of Scientific Instruments ◽

10.1063/1.5044504 ◽

2018 ◽

Vol 89 (10) ◽

pp. 103504 ◽

Author(s):

R. Agnello ◽

M. Barbisan ◽

I. Furno ◽

Ph. Guittienne ◽

A. A. Howling ◽

...

Keyword(s):

Plasma Source ◽

Negative Ion ◽

Cavity Ring Down Spectroscopy ◽

Helicon Plasma ◽

Ion Density ◽

Neutral Beams ◽

Cavity Ring Down

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High brightness laser/plasma source for high throughput submicron x-ray lithography

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.583239 ◽

1985 ◽

Vol 3 (1) ◽

pp. 258 ◽

Author(s):

Alan L. Hoffman

Keyword(s):

High Throughput ◽

Laser Plasma ◽

Plasma Source ◽

High Brightness ◽

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Investigation of collective oscillations in synthetic plasma composed of positive and negative ion beams

Vacuum ◽

10.1016/0042-207x(72)90489-7 ◽

1972 ◽

Vol 22 (3) ◽

pp. 114

Keyword(s):

Ion Beams ◽

Negative Ion ◽

Collective Oscillations

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A New Negative Ion Plasma Source for Material Processing

IEEE Conference Record - Abstracts. 2005 IEEE International Conference on Plasma Science ◽

10.1109/plasma.2005.359141 ◽

2005 ◽

Author(s):

Kazuya Fujiwara ◽

Masakatsu Endo ◽

Yasushi Ikeda ◽

Haruo Shindo

Keyword(s):

Material Processing ◽

Plasma Source ◽

Negative Ion ◽

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Critical issues for high-brightness heavy-ion beams- prioritized

10.2172/902371 ◽

2007 ◽

Author(s):

A Molvik ◽

R Cohen ◽

R Davidson ◽

A Faltens ◽

A Friedman ◽

...

Keyword(s):

Heavy Ion ◽

Ion Beams ◽

High Brightness ◽

Critical Issues

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Production of Group IIA atomic and molecular negative ion beams in a cesium-sputter negative ion source

Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment ◽

10.1016/0168-9002(96)00641-9 ◽

1996 ◽

Vol 379 (2) ◽

pp. 192-195 ◽

Author(s):

D Calabrese ◽

A.M Covington ◽

J.S Thompson

Keyword(s):

Ion Beams ◽

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