Remote plasma chemical vapor deposition for high-efficiency ultra-thin ∼25-microns crystalline Si solar cells

2012 IEEE 38th Photovoltaic Specialists Conference (PVSC) PART 2 ◽

10.1109/pvsc-vol2.2013.6656713 ◽

2013 ◽

Author(s):

D. Sarkar ◽

E. U. Onyegam ◽

S. Saha ◽

L. Mathew ◽

R. A. Rao ◽

...

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Efficiency ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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Remote plasma chemical vapor deposition for high-efficiency ultra-thin ∼25-microns crystalline Si solar cells

2012 IEEE 38th Photovoltaic Specialists Conference (PVSC) PART 2 ◽

10.1109/pvsc-vol2.2012.6656713 ◽

2012 ◽

Author(s):

D. Sarkar ◽

E. U. Onyegam ◽

S. Saha ◽

L. Mathew ◽

R. A. Rao ◽

...

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Efficiency ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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Growth of microcrystal silicon by remote plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.104661 ◽

1991 ◽

Vol 58 (3) ◽

pp. 281-283 ◽

Author(s):

Sung Chul Kim ◽

Moon Hyun Jung ◽

Jin Jang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Remote plasma chemical vapor deposition silicon oxynitride thin films: Dielectric properties

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590013 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1087 ◽

Author(s):

M. Hernández Vélez

Keyword(s):

Chemical Vapor Deposition ◽

Dielectric Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Oxynitride ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Oligomerization and Polymerization Steps in Remote Plasma Chemical Vapor Deposition of Silicon-Carbon and Silica Films from Organosilicon Sources.

Chemistry of Materials ◽

10.1021/cm012004o ◽

2001 ◽

Vol 13 (8) ◽

pp. 2742-2742 ◽

Author(s):

A. M. Wróbel ◽

A. Walkiewicz-Pietrzykowska ◽

Y. Hatanaka ◽

S. Wickramanayaka ◽

Y. Nakanishi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Silica Films ◽

Plasma Chemical Vapor Deposition ◽

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Molybdenum contamination in low‐temperature epitaxial silicon films grown by remote plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.118090 ◽

1996 ◽

Vol 69 (1) ◽

pp. 109-111 ◽

Author(s):

R. Sharma ◽

J. Fretwell ◽

B. Doris ◽

S. Banerjee

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Epitaxial Silicon ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Growth of GexSi1−x/Si heteroepitaxial films by remote plasma chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578116 ◽

1992 ◽

Vol 10 (4) ◽

pp. 1920-1926 ◽

Author(s):

R. Qian ◽

D. Kinosky ◽

T. Hsu ◽

J. Irby ◽

A. Mahajan ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Excitation energy dependence of photoluminescence in nanocrystalline silicon deposited by remote plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(98)00875-x ◽

1998 ◽

Vol 335 (1-2) ◽

pp. 266-269 ◽

Author(s):

Suk-Ho Choi ◽

Shin Hey Won ◽

Jin Jang

Keyword(s):

Chemical Vapor Deposition ◽

Excitation Energy ◽

Energy Dependence ◽

Vapor Deposition ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Deposition Mechanisms ofSiO2in Remote Plasma Chemical Vapor Deposition Analyzed by Spatially Resolved Mass Spectroscopy

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.4417 ◽

1994 ◽

Vol 33 (Part 1, No. 7B) ◽

pp. 4417-4420 ◽

Author(s):

Takashi Fuyuki ◽

Tohru Oka ◽

Hiroyuki Matsunami

Keyword(s):

Chemical Vapor Deposition ◽

Mass Spectroscopy ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Spatially Resolved

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Comparison of microstructure and surface passivation quality of intrinsic a-Si:H films deposited by remote plasma chemical vapor deposition using argon and helium plasma

2014 IEEE 40th Photovoltaic Specialist Conference (PVSC) ◽

10.1109/pvsc.2014.6925137 ◽

2014 ◽

Author(s):

E. U. Onyegam ◽

K. F. Wiedmar ◽

S. Saha ◽

William James ◽

S.K. Banerjee

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Surface Passivation ◽

Chemical Vapor ◽

Helium Plasma ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Characterization of a new reactor for remote plasma chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575796 ◽

1989 ◽

Vol 7 (4) ◽

pp. 2554-2561 ◽

Author(s):

Alan D. Huelsman ◽

R. Reif

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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