The electron spin resonance (e.s.r.) spectra of •CH3, •CHO, H and/or D, and possibly •CH2OH or •CH2OD were found by the ultraviolet (u.v.) photolysis of methanol —OH or —OD on porous high-silica glass at 77 °K. These e.s.r. spectra resemble the results of the u.v. photolysis of X-irradiated methanol indicating that some perturbation and/or sensitization occurred in the molecules by the glass surface. The absence of e.s.r. spectra from the same systems on the acid-leached glass, on the totally fluorinated glass, or on the totally —OH covered glass suggests that (i) the co-existence of surface contaminants, such as Al and Zr and not B, and some of surface —OH could be responsible for producing these free radicals, and (ii) the methanols adsorbed on these glass surfaces are stabilized against u.v. photolysis.
Improvement of Oxidation Resistivity of Carbon Material by High Silica Glass Impregnation