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Image formation in extreme ultraviolet lithography and numerical aperture effects
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
◽
10.1116/1.590941
◽
1999
◽
Vol 17
(6)
◽
pp. 2992
◽
Cited By ~ 12
Author(s):
Srinivas B. Bollepalli
◽
M. Khan
◽
Franco Cerrina
Keyword(s):
Extreme Ultraviolet
◽
Numerical Aperture
◽
Image Formation
◽
Extreme Ultraviolet Lithography
◽
Ultraviolet Lithography
Download Full-text
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Sub-diffraction-limited multilayer coatings for the 03 numerical aperture micro-exposure tool for extreme ultraviolet lithography
Applied Optics
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10.1364/ao.46.003736
◽
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◽
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◽
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◽
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◽
Extreme Ultraviolet Lithography
◽
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Design of a high-numerical-aperture extreme ultraviolet lithography illumination system
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◽
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◽
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◽
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◽
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◽
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Fabrication and evaluation of nickel-based high-k mask for high numerical aperture extreme ultraviolet lithography
Extreme Ultraviolet (EUV) Lithography XII
◽
10.1117/12.2586778
◽
2021
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Author(s):
Dongmin Jeong
◽
Yoon Jong Han
◽
Deuk Gyu Kim
◽
Yunsoo Kim
◽
Jinho Ahn
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Phase Shift Mask to Compensate for Mask 3D Effect in High-Numerical-Aperture Extreme Ultraviolet Lithography
Nanoscience and Nanotechnology Letters
◽
10.1166/nnl.2016.2249
◽
2016
◽
Vol 8
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◽
pp. 729-733
◽
Cited By ~ 1
Author(s):
Yong Ju Jang
◽
Jung Sik Kim
◽
Seongchul Hong
◽
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Extreme Ultraviolet
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Ultraviolet Lithography
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Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces
Infrared and Laser Engineering
◽
10.3788/irla201948.0814002
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2019
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◽
pp. 814002
Author(s):
毛姗姗 Mao Shanshan
◽
李艳秋 Li Yanqiu
◽
刘 克 Liu Ke
◽
刘丽辉 Liu Lihui
◽
郑 猛 Zheng Meng
◽
...
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Extreme Ultraviolet
◽
Optical Design
◽
Numerical Aperture
◽
Extreme Ultraviolet Lithography
◽
Freeform Surfaces
◽
Ultraviolet Lithography
◽
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Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5
10.1117/12.2012698
◽
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◽
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◽
Dominic Ashworth
◽
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◽
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◽
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◽
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◽
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◽
Extreme Ultraviolet Lithography
◽
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◽
Ultraviolet Lithography
◽
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Design of High Numerical Aperture Projection Objective for Industrial Extreme Ultraviolet Lithography
Acta Optica Sinica
◽
10.3788/aos201131.0222003
◽
2011
◽
Vol 31
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◽
pp. 0222003
Author(s):
刘菲 Liu Fei
◽
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Design of anamorphic magnification high-numerical aperture objective for extreme ultraviolet lithography by curvatures combination method
Applied Optics
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10.1364/ao.55.004917
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pp. 4917
◽
Cited By ~ 3
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Yan Liu
◽
Yanqiu Li
◽
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Numerical Aperture
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Combination Method
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Extreme Ultraviolet Lithography
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Ptychography as a wavefront sensor for high-numerical aperture extreme ultraviolet lithography: analysis and limitations
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◽
10.1117/1.oe.58.4.043102
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◽
Vol 58
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◽
pp. 1
Author(s):
Priya Dwivedi
◽
Silvania F. Pereira
◽
H. Paul Urbach
Keyword(s):
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Numerical Aperture
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Wavefront Sensor
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Extreme Ultraviolet Lithography
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Analysis of line-and-space resist patterns with sub-20 nm half-pitch fabricated using high-numerical-aperture exposure tool of extreme ultraviolet lithography
Japanese Journal of Applied Physics
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Extreme Ultraviolet Lithography
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