Analysis of line-and-space resist patterns with sub-20 nm half-pitch fabricated using high-numerical-aperture exposure tool of extreme ultraviolet lithography

2016 ◽  
Vol 55 (9) ◽  
pp. 096501 ◽  
Author(s):  
Takahiro Kozawa ◽  
Julius Joseph Santillan ◽  
Toshiro Itani
Keyword(s):  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
High Numerical Aperture ◽  
20 Nm

Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces

2019 ◽  
Vol 48 (8) ◽  
pp. 814002
Author(s):  
毛姗姗 Mao Shanshan ◽  
李艳秋 Li Yanqiu ◽  
刘 克 Liu Ke ◽  
刘丽辉 Liu Lihui ◽  
郑 猛 Zheng Meng ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Optical Design ◽  
Numerical Aperture ◽  
Extreme Ultraviolet Lithography ◽  
Freeform Surfaces ◽  
Ultraviolet Lithography ◽  
High Numerical Aperture

Sub-diffraction-limited multilayer coatings for the 03 numerical aperture micro-exposure tool for extreme ultraviolet lithography

2007 ◽  
Vol 46 (18) ◽  
pp. 3736 ◽  
Author(s):  
Regina Soufli ◽  
Russell M. Hudyma ◽  
Eberhard Spiller ◽  
Eric M. Gullikson ◽  
Mark A. Schmidt ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
Multilayer Coatings ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography
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