Extreme ultraviolet lithography patterned mask defect detection performance evaluation toward 16- to 11-nm half-pitch generation
2015 ◽
Vol 14
(3)
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pp. 033512
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2016 ◽
Vol 15
(2)
◽
pp. 021008
◽
2010 ◽
Vol 49
(6)
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pp. 06GD02
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2016 ◽
Vol 15
(2)
◽
pp. 023507
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2010 ◽
Vol 87
(11)
◽
pp. 2134-2138
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2005 ◽
Vol 44
(7B)
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pp. 5560-5564
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