Characterization of defect detection sensitivity in inspection of mask substrates and blanks for extreme-ultraviolet lithography

Mapping Intimacies ◽

10.1117/12.569849 ◽

2004 ◽

Author(s):

Edita Tejnil ◽

Eric M. Gullikson ◽

Alan R. Stivers

Keyword(s):

Defect Detection ◽

Extreme Ultraviolet ◽

Detection Sensitivity ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography

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Extreme ultraviolet lithography patterned mask defect detection performance evaluation toward 16- to 11-nm half-pitch generation

Journal of Micro/Nanolithography MEMS and MOEMS ◽

10.1117/1.jmm.14.3.033512 ◽

2015 ◽

Vol 14 (3) ◽

pp. 033512 ◽

Author(s):

Ryoichi Hirano ◽

Susumu Iida ◽

Tsuyoshi Amano ◽

Hidehiro Watanabe ◽

Masahiro Hatakeyama ◽

...

Keyword(s):

Performance Evaluation ◽

Defect Detection ◽

Extreme Ultraviolet ◽

Detection Performance ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography

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Characterization of out-of-band radiation and plasma parameters in laser-produced Sn plasmas for extreme ultraviolet lithography light sources

Journal of Applied Physics ◽

10.1063/1.2952033 ◽

2008 ◽

Vol 104 (1) ◽

pp. 013305 ◽

Author(s):

S. Namba ◽

S. Fujioka ◽

H. Sakaguchi ◽

H. Nishimura ◽

Y. Yasuda ◽

...

Keyword(s):

Extreme Ultraviolet ◽

Light Sources ◽

Extreme Ultraviolet Lithography ◽

Plasma Parameters ◽

Ultraviolet Lithography

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Characterization of extreme ultraviolet lithography mask defects from extreme ultraviolet far-field scattering patterns

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1319843 ◽

2000 ◽

Vol 18 (6) ◽

pp. 2930 ◽

Author(s):

Moonsuk Yi ◽

Seongtae Jeong ◽

Seno Rekawa ◽

Jeffrey Bokor

Keyword(s):

Extreme Ultraviolet ◽

Far Field ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography

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Study of extreme ultraviolet lithography patterned mask inspection tool for half-pitch 11-nm node defect detection performance

Journal of Micro/Nanolithography MEMS and MOEMS ◽

10.1117/1.jmm.15.2.021008 ◽

2016 ◽

Vol 15 (2) ◽

pp. 021008 ◽

Author(s):

Ryoichi Hirano ◽

Susumu Iida ◽

Tsuyoshi Amano ◽

Hidehiro Watanabe ◽

Masahiro Hatakeyama ◽

...

Keyword(s):

Defect Detection ◽

Extreme Ultraviolet ◽

Detection Performance ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Mask Inspection

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Picosecond ultrasonic characterization of Mo/Si multilayers for extreme ultraviolet lithography

10.1117/12.351136 ◽

1999 ◽

Author(s):

Nen-Wen Pu ◽

Seongtae Jeong ◽

Rian Zhao ◽

Jeffrey Bokor

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Ultrasonic Characterization

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Characterization of multilayer reflective coatings for extreme ultraviolet lithography

10.1063/1.1291768 ◽

2000 ◽

Author(s):

Marco Wedowski

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Reflective Coatings

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Velocity characterization of particulate debris from laser-produced plasmas used for extreme-ultraviolet lithography

Applied Optics ◽

10.1364/ao.34.006513 ◽

1995 ◽

Vol 34 (28) ◽

pp. 6513 ◽

Author(s):

H. A. Bender ◽

D. O’Connell ◽

W. T. Silfvast

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Particulate Debris

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Experimental test chamber design for optics exposure testing and debris characterization of a xenon discharge produced plasma source for extreme ultraviolet lithography

Microelectronic Engineering ◽

10.1016/j.mee.2005.11.012 ◽

2006 ◽

Vol 83 (3) ◽

pp. 476-484 ◽

Author(s):

Keith C. Thompson ◽

Erik L. Antonsen ◽

Matthew R. Hendricks ◽

Brian E. Jurczyk ◽

M. Williams ◽

...

Keyword(s):

Experimental Test ◽

Extreme Ultraviolet ◽

Test Chamber ◽

Plasma Source ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Chamber Design ◽

Exposure Testing

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Characterization of an expanded-field Schwarzschild objective for extreme ultraviolet lithography

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587448 ◽

1994 ◽

Vol 12 (6) ◽

pp. 3820 ◽

Author(s):

G. D. Kubiak

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography

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Actinic Phase Defect Detection for Extreme Ultraviolet Lithography Mask with Absorber Patterns

Japanese Journal of Applied Physics ◽

10.1143/jjap.49.06gd02 ◽

2010 ◽

Vol 49 (6) ◽

pp. 06GD02 ◽

Author(s):

Tsuneo Terasawa ◽

Takeshi Yamane ◽

Toshihiko Tanaka ◽

Osamu Suga ◽

Toshihisa Tomie

Keyword(s):

Defect Detection ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography

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